Zellner; Johannes

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zellner; Johannes.The latest application filed is for "euv collector for use in an euv projection exposure apparatus".

Company Profile

1.18.16

Zellner; Johannes - Aalen DE
Zellner; Johannes - Oberkochen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
EUV collector for use in an EUV projection exposure apparatus Grant 10,578,972 - Kierey , et al.	2020-03-03
Euv Collector For Use In An Euv Projection Exposure Apparatus App 20190033723 - Kierey; Holger ; et al.	2019-01-31
Projection objective of a microlithographic projection exposure apparatus Grant 9,372,411 - Zellner , et al. June 21, 2	2016-06-21
Projection objective for microlithography Grant 9,304,408 - Zellner , et al. April 5, 2	2016-04-05
Microlithographic imaging optical system including multiple mirrors Grant 9,195,145 - Mann , et al. November 24, 2	2015-11-24
Imaging optical system and illumination optical system Grant 9,182,578 - Mann , et al. November 10, 2	2015-11-10
Imaging optics and projection exposure installation for microlithography with an imaging optics Grant 9,057,964 - Mann , et al. June 16, 2	2015-06-16
Microlithographic Imaging Optical System Including Multiple Mirrors App 20150022799 - Mann; Hans-Juergen ; et al.	2015-01-22
Microlithographic imaging optical system including multiple mirrors Grant 8,873,122 - Mann , et al. October 28, 2	2014-10-28
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20140185024 - Zellner; Johannes ; et al.	2014-07-03
Projection Objective For Microlithography App 20140104588 - Zellner; Johannes ; et al.	2014-04-17
Projection objective for microlithography Grant 8,629,972 - Zellner , et al. January 14, 2	2014-01-14
Imaging Optical System And Illumination Optical System App 20120147347 - Mann; Hans-Juergen ; et al.	2012-06-14
Imaging Optics And Projection Exposure Installation For Microlithography With An Imaging Optics App 20120069315 - Mann; Hans-Juergen ; et al.	2012-03-22
Imaging Optics And Projection Exposure Installation For Microlithography With An Imaging Optics Of This Type App 20120069314 - Zellner; Johannes ; et al.	2012-03-22
Projection objective Grant 8,027,022 - Zellner , et al. September 27, 2	2011-09-27
Illumination system and microlithographic projection exposure apparatus including same Grant 7,999,917 - Zellner , et al. August 16, 2	2011-08-16
Imaging Optical System App 20110165522 - Mann; Hans-Juergen ; et al.	2011-07-07
Projection Objective For Microlithography App 20110026003 - Zellner; Johannes ; et al.	2011-02-03
Symmetrical objective having four lens groups for microlithography Grant 7,697,211 - Shafer , et al. April 13, 2	2010-04-13
Projection objective Grant 7,557,902 - Dinger , et al. July 7, 2	2009-07-07
Optical component, comprising a material with a predetermined homogeneity of thermal expansion Grant 7,524,072 - Laufer , et al. April 28, 2	2009-04-28
Symmetrical Objective Having Four Lens Groups For Microlithography App 20090080086 - Shafer; David R. ; et al.	2009-03-26
Projection Objective App 20090027644 - Zellner; Johannes ; et al.	2009-01-29
Illumination System And Microlithographic Projection Exposure Apparatus Including Same App 20090021713 - Zellner; Johannes ; et al.	2009-01-22
Projection exposure apparatus and projection optical system Grant 7,477,355 - Fehr , et al. January 13, 2	2009-01-13
Lithographic apparatus and method App 20080073596 - Derksen; Antonius Theodorus Anna Maria ; et al.	2008-03-27
Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature App 20070035814 - Dinger; Udo ; et al.	2007-02-15
Projection exposure apparatus and projection optical system App 20060119822 - Fehr; Jean-Noel ; et al.	2006-06-08
Optical component, comprising a material with a predetermined homogneity of thermal expansion App 20050185307 - Laufer, Timo ; et al.	2005-08-25

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.