Zellenrath; Mark
Patent Applications and Registrations
Patent applications and USPTO patent grants for Zellenrath; Mark.The latest application filed is for "euv lithography system and operating method".
- Zellenrath; Mark - Veldhoven NL
| Patent | Date |
|---|---|
| EUV lithography system and operating method Grant 10,073,361 - Ehm , et al. September 11, 2 | 2018-09-11 |
| EUV Lithography System And Operating Method App 20170212433 - EHM; Dirk Heinrich ; et al. | 2017-07-27 |
| Method of measuring focus of a lithographic projection apparatus Grant 8,436,998 - Hofmans , et al. May 7, 2 | 2013-05-07 |
| Method Of Measuring Focus Of A Lithographic Projection Apparatus App 20130003031 - Hofmans; Gerardus Carolus Johannus ; et al. | 2013-01-03 |
| Method of measuring focus of a lithographic projection apparatus Grant 8,289,516 - Hofmans , et al. October 16, 2 | 2012-10-16 |
| Method Of Measuring Focus Of A Lithographic Projection Apparatus App 20090135389 - HOFMANS; Gerardus Carolus Johannus ; et al. | 2009-05-28 |
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