Zelick; Nancy

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zelick; Nancy.The latest application filed is for "improved channel layer formed in an art trench".

Company Profile

2.11.16

Zelick; Nancy - Portland OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Channel layer formed in an art trench Grant 11,164,974 - Rachmady , et al. November 2, 2	2021-11-02
Improved Channel Layer Formed In An Art Trench App 20200220017 - Rachmady; Willy ; et al.	2020-07-09
Two-dimensional condensation for uniaxially strained semiconductor fins Grant 10,304,929 - Kavalieros , et al.	2019-05-28
Nanoscale structure with epitaxial film having a recessed bottom portion Grant 9,865,684 - Chu-Kung , et al. January 9, 2	2018-01-09
Two-dimensional Condensation For Uniaxially Strained Semiconductor Fins App 20170317172 - KAVALIEROS; Jack T. ; et al.	2017-11-02
Two-dimensional condensation for uniaxially strained semiconductor fins Grant 9,711,598 - Kavalieros , et al. July 18, 2	2017-07-18
Two-dimensional Condensation For Uniaxially Strained Semiconductor Fins App 20160329403 - Kavalieros; Jack T. ; et al.	2016-11-10
Two-dimensional condensation for uniaxially strained semiconductor fins Grant 9,419,140 - Kavalieros , et al. August 16, 2	2016-08-16
Two-dimensional Condensation For Uniaxially Strained Semiconductor Fins App 20160049513 - Kavalieros; Jack T. ; et al.	2016-02-18
Two-dimensional condensation for uniaxially strained semiconductor fins Grant 9,159,835 - Kavalieros , et al. October 13, 2	2015-10-13
Epitaxial Film On Nanoscale Structure App 20150249131 - CHU-KUNG; BENJAMIN ; et al.	2015-09-03
Epitaxial film on nanoscale structure Grant 9,029,835 - Chu-King , et al. May 12, 2	2015-05-12
Defect transferred and lattice mismatched epitaxial film Grant 8,872,225 - Chu-Kung , et al. October 28, 2	2014-10-28
Defect Transferred and Lattice Mismatched Epitaxial Film App 20140175512 - CHU-KUNG; BENJAMIN ; et al.	2014-06-26
Lattice Mismatched Hetero-Epitaxial Film App 20140175509 - CHU-KUNG; BENJAMIN ; et al.	2014-06-26
Epitaxial Film On Nanoscale Structure App 20140175379 - CHU-KUNG; BENJAMIN ; et al.	2014-06-26
Polish to remove topography in sacrificial gate layer prior to gate patterning Grant 8,334,184 - Steigerwald , et al. December 18, 2	2012-12-18
Two-dimensional Condensation For Uniaxially Strained Semiconductor Fins App 20120241818 - Kavalieros; Jack T. ; et al.	2012-09-27
Two-dimensional Condensation For Uniaxially Strained Semiconductor Fins App 20110147811 - Kavalieros; Jack T. ; et al.	2011-06-23
Polish To Remove Topography In Sacrificial Gate Layer Prior To Gate Patterning App 20110147812 - Steigerwald; Joseph M. ; et al.	2011-06-23
Sealing Spacer To Reduce Or Eliminate Lateral Oxidation Of A High-k Gate Dielectric App 20070262399 - Dewey; Gilbert ; et al.	2007-11-15

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.