Zaharan; Ofer
Patent Applications and Registrations
Patent applications and USPTO patent grants for Zaharan; Ofer.The latest application filed is for "methods of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology".
- Zaharan; Ofer - Jerusalem IL
| Patent | Date |
|---|---|
| Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology Grant 10,831,108 - Marciano , et al. November 10, 2 | 2020-11-10 |
| Decreasing inaccuracy due to non-periodic effects on scatterometric signals Grant 9,851,300 - Bringoltz , et al. December 26, 2 | 2017-12-26 |
| Methods Of Analyzing And Utilizing Landscapes To Reduce Or Eliminate Inaccuracy In Overlay Optical Metrology App 20160313658 - Marciano; Tal ; et al. | 2016-10-27 |
| Overlay metrology by pupil phase analysis Grant 8,582,114 - Manassen , et al. November 12, 2 | 2013-11-12 |
| Overlay Metrology By Pupil Phase Analysis App 20130044331 - Manassen; Amnon ; et al. | 2013-02-21 |
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