Zach; Franz X.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zach; Franz X..The latest application filed is for "method of compensating photomask data for the effects of etch and lithography processes".

Company Profile

0.8.8

Zach; Franz X. - Los Gatos CA
Zach; Franz X. - Santa Clara CA
Zach; Franz X. - Wappingers Falls NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of compensating photomask data for the effects of etch and lithography processes Grant 7,600,212 - Zach , et al. October 6, 2	2009-10-06
Method and system for reducing the impact of across-wafer variations on critical dimension measurements Grant 7,588,868 - Zach , et al. September 15, 2	2009-09-15
Calibration on wafer sweet spots Grant 7,444,615 - Percin , et al. October 28, 2	2008-10-28
Method for correcting position-dependent distortions in patterning of integrated circuits Grant 7,246,343 - Joshi , et al. July 17, 2	2007-07-17
Method of compensating photomask data for the effects of etch and lithography processes App 20070143733 - Zach; Franz X. ; et al.	2007-06-21
Characterizing flare of a projection lens Grant 7,189,481 - Wu , et al. March 13, 2	2007-03-13
Calibration on wafer sweet spots App 20060266243 - Percin; Gokhan ; et al.	2006-11-30
Alternating phase-shift mask rule compliant IC design Grant 7,124,396 - Zach October 17, 2	2006-10-17
Method and system for reducing the impact of across-wafer variations on critical dimension measurements App 20060073686 - Zach; Franz X. ; et al.	2006-04-06
Method for characterization of the illuminator in a lithographic system App 20060072097 - Zach; Franz X. ; et al.	2006-04-06
Characterizing flare of a projection lens App 20060046167 - Wu; Bo ; et al.	2006-03-02
Method for correcting position-dependent distortions in patterning of integrated circuits App 20060048091 - Joshi; Devendra ; et al.	2006-03-02
Alternating Phase-shift Mask Rule Compliant Ic Design App 20050210436 - Zach, Franz X.	2005-09-22
Process to suppress lithography at a wafer edge Grant 6,927,172 - Bergner , et al. August 9, 2	2005-08-09
Process to suppress lithography at a wafer edge App 20040166677 - Bergner, Wolfgang ; et al.	2004-08-26
Method for producing constant profile sidewalls Grant 6,132,940 - Mih , et al. October 17, 2	2000-10-17

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