Zable; Harold Robert

Patent Applications and Registrations

Patent applications and USPTO patent grants for Zable; Harold Robert.The latest application filed is for "method and system for determining a charged particle beam exposure for a local pattern density".

Company Profile

6.23.30

Zable; Harold Robert - Palo Alto CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method And System For Determining A Charged Particle Beam Exposure For A Local Pattern Density App 20210313143 - Fujimura; Akira ; et al.	2021-10-07
Bias correction for lithography Grant 11,126,085 - Zable September 21, 2	2021-09-21
Method and system for determining a charged particle beam exposure for a local pattern density Grant 11,062,878 - Fujimura , et al. July 13, 2	2021-07-13
Method And System Of Reducing Charged Particle Beam Write Time App 20210208569 - Fujimura; Akira ; et al.	2021-07-08
Method And System Of Reducing Charged Particle Beam Write Time App 20210116884 - Fujimura; Akira ; et al.	2021-04-22
Method and system of reducing charged particle beam write time Grant 10,884,395 - Fujimura , et al. January 5, 2	2021-01-05
Method And System For Determining A Charged Particle Beam Exposure For A Local Pattern Density App 20200373122 - Fujimura; Akira ; et al.	2020-11-26
Bias Correction For Lithography App 20200341380 - Zable; Harold Robert	2020-10-29
Method and system for determining a charged particle beam exposure for a local pattern density Grant 10,748,744 - Fujimura , et al. A	2020-08-18
Bias correction for lithography Grant 10,725,383 - Zable	2020-07-28
Method And System Of Reducing Charged Particle Beam Write Time App 20200201286 - Fujimura; Akira ; et al.	2020-06-25
Bias Correction For Lithography App 20200012195 - Zable; Harold Robert	2020-01-09
Shaped beam lithography including temperature effects Grant 10,460,071 - Fujimura , et al. Oc	2019-10-29
Bias correction for lithography Grant 10,444,629 - Zable Oc	2019-10-15
Method And System For Forming Patterns Using Charged Particle Beam Lithography With Variable Pattern Dosage App 20180374675 - Fujimura; Akira ; et al.	2018-12-27
Bias Correction For Lithography App 20170371246 - Zable; Harold Robert	2017-12-28
Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage App 20170213698 - Fujimura; Akira ; et al.	2017-07-27
Method And System For Forming Patterns Using Shaped Beam Lithography Including Temperature Effects App 20170124247 - Fujimura; Akira ; et al.	2017-05-04
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage Grant 9,625,809 - Fujimura , et al. April 18, 2	2017-04-18
Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage App 20160299422 - Fujimura; Akira ; et al.	2016-10-13
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage Grant 9,372,391 - Fujimura , et al. June 21, 2	2016-06-21
Method And System For Forming Patterns Using Charged Particle Beam Lithography With Variable Pattern Dosage App 20150331991 - Fujimura; Akira ; et al.	2015-11-19
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages Grant 8,895,212 - Zable , et al. November 25, 2	2014-11-25
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes Grant 8,883,375 - Zable , et al. November 11, 2	2014-11-11
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area Grant 8,771,906 - Zable , et al. July 8, 2	2014-07-08
Method for design and manufacture of patterns with variable shaped beam lithography Grant 8,592,108 - Fujimura , et al. November 26, 2	2013-11-26
Method And System For Forming A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes App 20130309610 - Zable; Harold Robert ; et al.	2013-11-21
Method And System For Forming A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes With Different Dosages App 20130309608 - Zable; Harold Robert ; et al.	2013-11-21
Method And System For Forming A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes Which Expose Different Surface Area App 20130309609 - Zable; Harold Robert ; et al.	2013-11-21
Method and system for fracturing a pattern using lithography with multiple exposure passes Grant 8,492,055 - Zable , et al. July 23, 2	2013-07-23
Method For Design And Manufacture Of Patterns With Variable Shaped Beam Lithography App 20130101941 - Fujimura; Akira ; et al.	2013-04-25
Method And System For Manufacturing A Surface Using Shaped Charged Particle Beam Lithography App 20130022929 - Komagata; Takashi ; et al.	2013-01-24
Method for design and manufacture of diagonal patterns with variable shaped beam lithography Grant 8,329,365 - Fujimura , et al. December 11, 2	2012-12-11
Method And System For Fracturing A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes App 20120281191 - Zable; Harold Robert ; et al.	2012-11-08
Method And System For Forming Patterns Using Charged Particle Beam Lithography With Variable Pattern Dosage App 20120219886 - Fujimura; Akira ; et al.	2012-08-30
Method And System For Forming Patterns Using Charged Particle Beam Lithography With Overlapping Shots App 20120217421 - Fujimura; Akira ; et al.	2012-08-30
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes Grant 8,221,940 - Zable , et al. July 17, 2	2012-07-17
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages Grant 8,221,939 - Zable , et al. July 17, 2	2012-07-17
Method for Matching of Patterns App 20120128228 - Fujimura; Akira ; et al.	2012-05-24
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area Grant 8,137,871 - Zable , et al. March 20, 2	2012-03-20
Method For Design And Manufacture Of Diagonal Patterns With Variable Shaped Beam Lithography App 20120064440 - Fujimura; Akira ; et al.	2012-03-15
Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography Grant 8,062,813 - Zable , et al. November 22, 2	2011-11-22
Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography Grant 8,017,286 - Fujimura , et al. September 13, 2	2011-09-13
Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots Grant 7,985,514 - Fujimura , et al. July 26, 2	2011-07-26
Method And System For Fracturing A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes App 20110159436 - Zable; Harold Robert ; et al.	2011-06-30
Method And System For Fracturing A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes Having Different Dosages App 20110159434 - Zable; Harold Robert ; et al.	2011-06-30
Method And System For Fracturing A Pattern Using Charged Particle Beam Lithography With Multiple Exposure Passes Which Expose Different Surface Area App 20110159435 - Zable; Harold Robert ; et al.	2011-06-30
Method And System For Manufacturing A Surface Using Charged Particle Beam Lithography App 20110089345 - Komagata; Takashi ; et al.	2011-04-21
Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots App 20110089344 - Fujimura; Akira ; et al.	2011-04-21
Method For Design And Manufacture Of A Reticle Using A Two-dimensional Dosage Map And Charged Particle Beam Lithography App 20100183963 - Zable; Harold Robert ; et al.	2010-07-22
Method For Design And Manufacture Of A Reticle Using A Two-dimensional Dosage Map And Charged Particle Beam Lithography App 20100055587 - Fujimura; Akira ; et al.	2010-03-04
Cylindrical wrapping using shader hardware Grant 7,663,621 - Allen , et al. February 16, 2	2010-02-16

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