ZAAL; Martijn Maria

Patent Applications and Registrations

Patent applications and USPTO patent grants for ZAAL; Martijn Maria.The latest application filed is for "method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets".

Company Profile

4.4.6

ZAAL; Martijn Maria - Veldhoven NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibrating A Metrology Process, Method Of Selecting Metrology Targets App 20210255552 - VENSELAAR; Joannes Jitse ; et al.	2021-08-19
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets Grant 11,022,897 - Venselaar , et al. June 1, 2	2021-06-01
Method And Apparatus To Determine A Patterning Process Parameter App 20210035871 - VAN LEEST; Adriaan Johan ; et al.	2021-02-04
Method and apparatus to determine a patterning process parameter Grant 10,811,323 - Van Leest , et al. October 20, 2	2020-10-20
Method of optimizing a metrology process Grant 10,585,354 - Tsiatmas , et al.	2020-03-10
Method and device for determining adjustments to sensitivity parameters Grant 10,520,830 - Kicken , et al. Dec	2019-12-31
Method Of Optimizing A Metrology Process App 20190243253 - TSIATMAS; Anagnostis ; et al.	2019-08-08
Method And Device For Determining Adjustments To Sensitivity Parameters App 20190204755 - KICKEN; Harm Hubertus Joseph Elizabeth ; et al.	2019-07-04
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibratin App 20190171115 - VENSELAAR; Joannes Jitse ; et al.	2019-06-06
Method And Apparatus To Determine A Patterning Process Parameter App 20170255112 - VAN LEEST; Adriaan Johan ; et al.	2017-09-07

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