loadpatents
name:-0.018828868865967
name:-0.0092740058898926
name:-0.016228199005127
Yun; Sunghoon Patent Filings

Yun; Sunghoon

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yun; Sunghoon.The latest application filed is for "polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same".

Company Profile
14.7.18
  • Yun; Sunghoon - Gyeonggi-do KR
  • Yun; Sunghoon - Seongnam-si KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same
Grant 11,400,559 - Joeng , et al. August 2, 2
2022-08-02
Polishing Pad, Process For Preparing The Same, And Process For Preparing A Semiconductor Device Using The Same
App 20220152776 - YUN; Sunghoon ;   et al.
2022-05-19
Classifying and purifying apparatus of solid blowing agents and methods of classifying and purifying solid blowing agents
Grant 11,325,159 - Yun , et al. May 10, 2
2022-05-10
Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same
Grant 11,298,795 - Yun , et al. April 12, 2
2022-04-12
Leakage-proof polishing pad and process for preparing the same
Grant 11,267,098 - Yun , et al. March 8, 2
2022-03-08
Polishing Pad And Method For Producing Same
App 20210354267 - RYOU; Joonsung ;   et al.
2021-11-18
Polishing Pad Having Excellent Airtightness
App 20210291314 - YUN; Sunghoon ;   et al.
2021-09-23
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same
App 20210162560 - AHN; Jaein ;   et al.
2021-06-03
Classifying And Purifying Apparatus Of Solid Blowing Agents And Methods Of Classifying And Purifying Solid Blowing Agents
App 20210154705 - YUN; Sunghoon ;   et al.
2021-05-27
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same
App 20210154797 - HEO; Hyeyoung ;   et al.
2021-05-27
Polishing pad that minimizes occurrence of defects and process for preparing the same
Grant 11,000,935 - Yun , et al. May 11, 2
2021-05-11
Polishing Pad, Process For Preparing The Same, And Process For Preparing A Semiconductor Device Using The Same
App 20210129285 - JOENG; Eun Sun ;   et al.
2021-05-06
Polishing Pad, Process For Preparing The Same, And Process For Preparing A Semiconductor Device Using The Same
App 20210122006 - YUN; Sunghoon ;   et al.
2021-04-29
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad
App 20210094144 - AHN; Jaein ;   et al.
2021-04-01
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad
App 20210094143 - AHN; Jaein ;   et al.
2021-04-01
Polishing Pad That Minimizes Occurrence Of Defects And Process For Preparing The Same
App 20200306921 - YUN; Sunghoon ;   et al.
2020-10-01
Polishing Pad Comprising Window Similar In Hardness To Polishing Layer
App 20200164483 - YUN; Sunghoon ;   et al.
2020-05-28
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
Grant 10,518,383 - Ahn , et al. Dec
2019-12-31
Polishing Pad With Improved Fluidity Of Slurry And Process For Preparing Same
App 20190389033 - YUN; Sunghoon ;   et al.
2019-12-26
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
Grant 10,513,007 - Ahn , et al. Dec
2019-12-24
Porous Polyurethane Polishing Pad And Process For Producing The Same
App 20190321937 - HEO; Hye Young ;   et al.
2019-10-24
Porous Polishing Pad And Process For Producing The Same
App 20190314954 - HEO; Hye Young ;   et al.
2019-10-17
Leakage-proof Polishing Pad And Process For Preparing The Same
App 20190111542 - YUN; Sunghoon ;   et al.
2019-04-18
Porous Polyurethane Polishing Pad And Process For Preparing A Semiconductor Device By Using The Same
App 20180339393 - AHN; Jaein ;   et al.
2018-11-29
Porous Polyurethane Polishing Pad And Process For Preparing A Semiconductor Device By Using The Same
App 20180339394 - AHN; Jaein ;   et al.
2018-11-29

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed