YUN; Jong Wook

Patent Applications and Registrations

Patent applications and USPTO patent grants for YUN; Jong Wook.The latest application filed is for "polishing pad, method for producing the same and method of fabricating semiconductor device using the same".

Company Profile

15.6.27

YUN; Jong Wook - Seoul KR
Yun; Jong Wook - Gyeonggi-do KR
YUN; Jong Wook - Suwon-si KR
Yun; Jong Wook - Busan KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing Pad, Method For Producing The Same And Method Of Fabricating Semiconductor Device Using The Same App 20220288743 - YUN; Jong Wook ; et al.	2022-09-15
Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same Grant 11,400,559 - Joeng , et al. August 2, 2	2022-08-02
Polishing Pad, Manufacturing Method Thereof, Method For Manufacturing Semiconductor Device Using Same App 20220203496 - YUN; Jong Wook ; et al.	2022-06-30
Polishing Pad, Method For Producing The Same And Method Of Fabricating Semiconductor Device Using The Same App 20220143778 - HEO; Hye Young ; et al.	2022-05-12
Polishing Pad, Manufacturing Method Thereof And Preparing Method Of Semiconductor Device Using The Same App 20220097201 - YUN; Jong Wook ; et al.	2022-03-31
Polishing Pad And Method Of Fabricating Semiconductor Device Using The Same App 20220097197 - JOENG; Eun Sun ; et al.	2022-03-31
Composition for polishing pad, polishing pad and preparation method thereof Grant 11,279,825 - Joeng , et al. March 22, 2	2022-03-22
Polishing Pad And Method Of Fabricating Semiconductor Device Using The Same App 20220073694 - Joeng; Eun Sun ; et al.	2022-03-10
Polishing Pad And Method Of Fabricating Semiconductor Device Using The Same App 20220072678 - JOENG; Eun Sun ; et al.	2022-03-10
Leakage-proof polishing pad and process for preparing the same Grant 11,267,098 - Yun , et al. March 8, 2	2022-03-08
Polishing Pad And Method For Preparing Semiconductor Device Using The Same App 20220059401 - YUN; Jong Wook ; et al.	2022-02-24
Composition for polishing pad, polishing pad and preparation method of semiconductor device Grant 11,207,757 - Joeng , et al. December 28, 2	2021-12-28
Polishing Pad Having Excellent Airtightness App 20210291314 - YUN; Sunghoon ; et al.	2021-09-23
Polishing Pad And Method For Preparing Semiconductor Device Using Same App 20210291315 - SEO; Jangwon ; et al.	2021-09-23
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same App 20210154797 - HEO; Hyeyoung ; et al.	2021-05-27
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same App 20210138605 - HEO; Hyeyoung ; et al.	2021-05-13
Polishing pad that minimizes occurrence of defects and process for preparing the same Grant 11,000,935 - Yun , et al. May 11, 2	2021-05-11
Polishing Pad With Adjusted Crosslinking Degree And Process For Preparing The Same App 20210129284 - YUN; Jong Wook ; et al.	2021-05-06
Polishing Pad, Process For Preparing The Same, And Process For Preparing A Semiconductor Device Using The Same App 20210129285 - JOENG; Eun Sun ; et al.	2021-05-06
Composition For Polishing Pad And Polishing Pad App 20210122007 - YUN; Jong Wook ; et al.	2021-04-29
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad App 20210094143 - AHN; Jaein ; et al.	2021-04-01
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad App 20210094144 - AHN; Jaein ; et al.	2021-04-01
Composition For Polishing Pad, Polishing Pad And Preparation Method Of Semiconductor Device App 20200391344 - JOENG; Eun Sun ; et al.	2020-12-17
Polishing Pad With Improved Crosslinking Density And Process For Preparing The Same App 20200368873 - YUN; Jong Wook ; et al.	2020-11-26
Polishing Pad That Minimizes Occurrence Of Defects And Process For Preparing The Same App 20200306921 - YUN; Sunghoon ; et al.	2020-10-01
Composition For A Polishing Pad, Polishing Pad, And Process For Preparing The Same App 20200207904 - JOENG; Eun Sun ; et al.	2020-07-02
Composition For Polishing Pad, Polishing Pad And Preparation Method Thereof App 20200207981 - JOENG; Eun Sun ; et al.	2020-07-02
Polishing Pad With Improved Fluidity Of Slurry And Process For Preparing Same App 20190389033 - YUN; Sunghoon ; et al.	2019-12-26
Porous Polyurethane Polishing Pad And Process For Producing The Same App 20190321937 - HEO; Hye Young ; et al.	2019-10-24
Porous Polishing Pad And Process For Producing The Same App 20190314954 - HEO; Hye Young ; et al.	2019-10-17
Leakage-proof Polishing Pad And Process For Preparing The Same App 20190111542 - YUN; Sunghoon ; et al.	2019-04-18
Highly elastic polyester modified urethane resin and clear coat composition containing same Grant 10,239,986 - Choi , et al.	2019-03-26
Highly Elastic Polyester Modified Urethane Resin And Clear Coat Composition Containing Same App 20180022858 - CHOI; Yong Ho ; et al.	2018-01-25

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