YUN; Huichan

Patent Applications and Registrations

Patent applications and USPTO patent grants for YUN; Huichan.The latest application filed is for "composition for forming silica layer, manufacturing method for silica layer, and silica layer".

Company Profile

1.4.6

YUN; Huichan - Suwon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition For Forming Silica Layer, Manufacturing Method For Silica Layer, And Silica Layer App 20200369915 - NOH; Kunbae ; et al.	2020-11-26
Method of forming patterns, patterns formed according to the method, and semiconductor device including the patterns Grant 10,153,171 - Yun , et al. Dec	2018-12-11
Composition for forming silica layer, method for manufacturing silica layer and silica layer Grant 10,106,687 - Jang , et al. October 23, 2	2018-10-23
Method Of Forming Patterns, Patterns Formed According To The Method, And Semiconductor Device Including The Patterns App 20180204730 - YUN; Huichan ; et al.	2018-07-19
Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer Grant 10,017,646 - Sim , et al. July 10, 2	2018-07-10
Composition For Forming Silica Layer, Method For Manufacturing Silica Layer, And Electric Device Including Silica Layer App 20180163055 - SIM; Sooyeon ; et al.	2018-06-14
Composition For Forming Silica Layer, Method For Manufacturing Silica Layer, And Silica Layer App 20170250206 - Han; Kwen-Woo ; et al.	2017-08-31
Method for manufacturing silica layer, silica layer, and electronic device Grant 9,721,785 - Lee , et al. August 1, 2	2017-08-01
Method For Manufacturing Silica Layer, Silica Layer, And Electronic Device App 20170092488 - LEE; Jiho ; et al.	2017-03-30
Composition For Forming Silica Layer, Method For Manufacturing Silica Layer And Silica Layer App 20170029624 - Jang; Junyoung ; et al.	2017-02-02

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