loadpatents
name:-0.02030086517334
name:-0.016882181167603
name:-0.00059700012207031
Yui; Yoshikiyo Patent Filings

Yui; Yoshikiyo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yui; Yoshikiyo.The latest application filed is for "charged particle optical system, drawing apparatus, and method of manufacturing article".

Company Profile
0.15.13
  • Yui; Yoshikiyo - Utsunomiya JP
  • Yui; Yoshikiyo - Utsunomiya-shi JP
  • Yui; Yoshikiyo - Tochigi JP
  • Yui; Yoshikiyo - Kawasaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Charged particle beam drawing apparatus and method of manufacturing article
Grant 8,754,382 - Suzuki , et al. June 17, 2
2014-06-17
Charged particle optical system, drawing apparatus, and method of manufacturing article
Grant 8,716,672 - Sano , et al. May 6, 2
2014-05-06
Charged Particle Optical System, Drawing Apparatus, And Method Of Manufacturing Article
App 20130273478 - Sano; Kentaro ;   et al.
2013-10-17
Charged Particle Beam Drawing Apparatus And Method Of Manufacturing Article
App 20130068959 - SUZUKI; Takehiko ;   et al.
2013-03-21
Multi-electron beam exposure method and apparatus
Grant 7,126,140 - Yoda , et al. October 24, 2
2006-10-24
Multi-electron beam exposure method and apparatus
Grant 7,067,830 - Yoda , et al. June 27, 2
2006-06-27
Electron beam source and electron beam exposure apparatus employing the electron beam source
Grant 6,992,307 - Yui , et al. January 31, 2
2006-01-31
Multi-electron beam exposure method and apparatus
App 20060017021 - Yoda; Haruo ;   et al.
2006-01-26
Charged particle beam drawing apparatus
App 20050285054 - Inoue, Yuji ;   et al.
2005-12-29
Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method
Grant 6,903,352 - Muraki , et al. June 7, 2
2005-06-07
Electron beam source and electron beam exposure apparatus employing the electron beam source
App 20040262539 - Yui, Yoshikiyo ;   et al.
2004-12-30
Correcting method for correcting exposure data used for a charged particle beam exposure system
Grant 6,835,937 - Muraki , et al. December 28, 2
2004-12-28
Charged-particle beam exposure apparatus and device manufacturing method using the same
Grant 6,777,697 - Yui , et al. August 17, 2
2004-08-17
Multi-electron beam exposure method and apparatus
App 20040143356 - Yoda, Haruo ;   et al.
2004-07-22
Exposure method and device manufacturing method using this exposure method
Grant 6,741,732 - Yui May 25, 2
2004-05-25
Exposure Method And Device Manufacturing Method Using This Exposure Method
App 20040071336 - YUI, YOSHIKIYO
2004-04-15
Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same
Grant 6,667,486 - Ohta , et al. December 23, 2
2003-12-23
Electron Beam Exposure Method, Electron Beam Exposure Apparatus And Device Manufacturing Method Using The Same
App 20030189181 - Ohta, Hiroya ;   et al.
2003-10-09
Electron gun and electron beam drawing apparatus using the same
Grant 6,593,686 - Yui July 15, 2
2003-07-15
Charged-particle Beam Exposure Apparatus And Device Manufacturing Method Using The Same
App 20030094584 - Yui, Yoshikiyo ;   et al.
2003-05-22
Mask Pattern Transfer Method, Mask Pattern Transfer Apparatus Using The Method, And Device Manufacturing Method
App 20030034460 - Ono, Haruhito ;   et al.
2003-02-20
Control system for a charged particle exposure apparatus
Grant 6,483,120 - Yui , et al. November 19, 2
2002-11-19
Transfer Apparatus And Transfer Method
App 20020163628 - Yui, Yoshikiyo ;   et al.
2002-11-07
Transfer apparatus and transfer method
Grant 6,466,301 - Yui , et al. October 15, 2
2002-10-15
Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method
App 20020008207 - Muraki, Masato ;   et al.
2002-01-24
Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing method
App 20010004185 - Muraki, Masato ;   et al.
2001-06-21
Exposure control system
Grant 5,107,275 - Tsuruoka , et al. April 21, 1
1992-04-21
Method and apparatus for automatic focusing
Grant 4,714,331 - Oda , et al. December 22, 1
1987-12-22

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