Patent | Date |
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Methods and compositions for reducing line wide roughness Grant 7,867,687 - Yueh , et al. January 11, 2 | 2011-01-11 |
Phenolic/alicyclic copolymers and photoresists Grant 7,700,256 - Barclay , et al. April 20, 2 | 2010-04-20 |
Methods and compositions for providing photoresist with improved properties for contacting liquids Grant 7,678,527 - Meagley , et al. March 16, 2 | 2010-03-16 |
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method Grant 7,459,260 - Chandhok , et al. December 2, 2 | 2008-12-02 |
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists Grant 7,442,487 - Yueh , et al. October 28, 2 | 2008-10-28 |
Photoresists with reduced outgassing for extreme ultraviolet lithography Grant 7,427,463 - Cao , et al. September 23, 2 | 2008-09-23 |
Luminescent photoresist App 20080076058 - Leeson; Michael J. ;   et al. | 2008-03-27 |
Non-outgassing low activation energy resist Grant 7,226,718 - Cao , et al. June 5, 2 | 2007-06-05 |
Molecular photoresist App 20070122734 - Roberts; Jeanette M. ;   et al. | 2007-05-31 |
Non-outgassing Low Activation Energy Resist App 20070059634 - Cao; Heidi B. ;   et al. | 2007-03-15 |
Cure during rinse to prevent resist collapse App 20060292500 - Roberts; Jeanette ;   et al. | 2006-12-28 |
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages Grant 7,147,986 - Yueh , et al. December 12, 2 | 2006-12-12 |
Resist compounds including acid labile groups having hydrophilic groups attached thereto Grant 7,147,985 - Yueh , et al. December 12, 2 | 2006-12-12 |
Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material Grant 7,125,793 - Liou , et al. October 24, 2 | 2006-10-24 |
Polymer and photoresist compositions Grant 7,118,847 - Szmanda , et al. October 10, 2 | 2006-10-10 |
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method App 20060223000 - Chandhok; Manish ;   et al. | 2006-10-05 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 7,105,266 - Barclay , et al. September 12, 2 | 2006-09-12 |
Monomers, polymers, methods of synthesis thereof and photoresist compositions Grant 7,022,454 - Barclay , et al. April 4, 2 | 2006-04-04 |
Photoresist formulation with surfactant additive App 20060046183 - Yueh; Wang ;   et al. | 2006-03-02 |
One component EUV photoresist Grant 7,005,227 - Yueh , et al. February 28, 2 | 2006-02-28 |
Basic supercritical solutions for quenching and developing photoresists App 20060003271 - Clark; ShanC ;   et al. | 2006-01-05 |
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages App 20050221219 - Yueh, Wang ;   et al. | 2005-10-06 |
Resist compounds including acid labile groups having hydrophilic groups attached thereto App 20050221217 - Yueh, Wang ;   et al. | 2005-10-06 |
Polymer and photoresist compositions App 20050170278 - Szmanda, Charles R. ;   et al. | 2005-08-04 |
Reducing outgassing of reactive material upon exposure of photolithography resists App 20050158654 - Yueh, Wang ;   et al. | 2005-07-21 |
One component EUV photoresist App 20050158650 - Yueh, Wang ;   et al. | 2005-07-21 |
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists App 20050147916 - Yueh, Wang ;   et al. | 2005-07-07 |
Method and materials for self-aligned dual damascene interconnect structure App 20050133920 - Liou, Huey-Chiang ;   et al. | 2005-06-23 |
Reducing photoresist line edge roughness using chemically-assisted reflow App 20050084807 - Meagley, Robert P. ;   et al. | 2005-04-21 |
Methods and compositions for reducing line wide roughness App 20050084793 - Yueh, Wang ;   et al. | 2005-04-21 |
Methods and compositions for providing photoresist with improved properties for contacting liquids App 20050084794 - Meagley, Robert P. ;   et al. | 2005-04-21 |
Photoresists with reduced outgassing for extreme ultraviolet lithography App 20050079438 - Cao, Heidi ;   et al. | 2005-04-14 |
Langmuir-blodgett chemically amplified photoresist Grant 6,864,192 - Liou , et al. March 8, 2 | 2005-03-08 |
Copolymers and photoresist compositions comprising same Grant 6,849,381 - Barclay , et al. February 1, 2 | 2005-02-01 |
Photoresist performance through control of polymer characteristics App 20040265734 - Yueh, Wang ;   et al. | 2004-12-30 |
Copolymers and photoresist compositions comprising same Grant 6,777,157 - Barclay , et al. August 17, 2 | 2004-08-17 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 6,680,159 - Barclay , et al. January 20, 2 | 2004-01-20 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same App 20030224282 - Barclay, George G. ;   et al. | 2003-12-04 |
Novel copolymers and photoresist compositions comprising same App 20030215742 - Barclay, George G. ;   et al. | 2003-11-20 |
Phenolic/alicyclic copolymers and photoresists App 20030207200 - Barclay, George G. ;   et al. | 2003-11-06 |
Polymer and photoresist compositions Grant 6,599,677 - Szmanda , et al. July 29, 2 | 2003-07-29 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same App 20030073030 - Barclay, George G. ;   et al. | 2003-04-17 |
Phenolic/alicyclic copolymers and photoresists Grant 6,492,086 - Barclay , et al. December 10, 2 | 2002-12-10 |
Polymer and photoresist compositions App 20020173680 - Szmanda, Charles R. ;   et al. | 2002-11-21 |
Polymer and photoresist compositions App 20020160302 - Szmanda, Charles R. ;   et al. | 2002-10-31 |
Polymer and photoresist compositions App 20020155380 - Szmanda, Charles R. ;   et al. | 2002-10-24 |
Polymer and photoresist compositions Grant 6,406,828 - Szmanda , et al. June 18, 2 | 2002-06-18 |
Novel monomers, polymers, methods of synthesis thereof and photoresist compositions App 20020013448 - Barclay, George G. ;   et al. | 2002-01-31 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 6,306,554 - Barclay , et al. October 23, 2 | 2001-10-23 |