Yueh; Wang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yueh; Wang.The latest application filed is for "luminescent photoresist".

Company Profile

0.22.27

Yueh; Wang - Portland OR
Yueh; Wang - Shrewsbury MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods and compositions for reducing line wide roughness Grant 7,867,687 - Yueh , et al. January 11, 2	2011-01-11
Phenolic/alicyclic copolymers and photoresists Grant 7,700,256 - Barclay , et al. April 20, 2	2010-04-20
Methods and compositions for providing photoresist with improved properties for contacting liquids Grant 7,678,527 - Meagley , et al. March 16, 2	2010-03-16
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method Grant 7,459,260 - Chandhok , et al. December 2, 2	2008-12-02
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists Grant 7,442,487 - Yueh , et al. October 28, 2	2008-10-28
Photoresists with reduced outgassing for extreme ultraviolet lithography Grant 7,427,463 - Cao , et al. September 23, 2	2008-09-23
Luminescent photoresist App 20080076058 - Leeson; Michael J. ; et al.	2008-03-27
Non-outgassing low activation energy resist Grant 7,226,718 - Cao , et al. June 5, 2	2007-06-05
Molecular photoresist App 20070122734 - Roberts; Jeanette M. ; et al.	2007-05-31
Non-outgassing Low Activation Energy Resist App 20070059634 - Cao; Heidi B. ; et al.	2007-03-15
Cure during rinse to prevent resist collapse App 20060292500 - Roberts; Jeanette ; et al.	2006-12-28
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages Grant 7,147,986 - Yueh , et al. December 12, 2	2006-12-12
Resist compounds including acid labile groups having hydrophilic groups attached thereto Grant 7,147,985 - Yueh , et al. December 12, 2	2006-12-12
Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material Grant 7,125,793 - Liou , et al. October 24, 2	2006-10-24
Polymer and photoresist compositions Grant 7,118,847 - Szmanda , et al. October 10, 2	2006-10-10
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method App 20060223000 - Chandhok; Manish ; et al.	2006-10-05
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 7,105,266 - Barclay , et al. September 12, 2	2006-09-12
Monomers, polymers, methods of synthesis thereof and photoresist compositions Grant 7,022,454 - Barclay , et al. April 4, 2	2006-04-04
Photoresist formulation with surfactant additive App 20060046183 - Yueh; Wang ; et al.	2006-03-02
One component EUV photoresist Grant 7,005,227 - Yueh , et al. February 28, 2	2006-02-28
Basic supercritical solutions for quenching and developing photoresists App 20060003271 - Clark; ShanC ; et al.	2006-01-05
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages App 20050221219 - Yueh, Wang ; et al.	2005-10-06
Resist compounds including acid labile groups having hydrophilic groups attached thereto App 20050221217 - Yueh, Wang ; et al.	2005-10-06
Polymer and photoresist compositions App 20050170278 - Szmanda, Charles R. ; et al.	2005-08-04
Reducing outgassing of reactive material upon exposure of photolithography resists App 20050158654 - Yueh, Wang ; et al.	2005-07-21
One component EUV photoresist App 20050158650 - Yueh, Wang ; et al.	2005-07-21
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists App 20050147916 - Yueh, Wang ; et al.	2005-07-07
Method and materials for self-aligned dual damascene interconnect structure App 20050133920 - Liou, Huey-Chiang ; et al.	2005-06-23
Reducing photoresist line edge roughness using chemically-assisted reflow App 20050084807 - Meagley, Robert P. ; et al.	2005-04-21
Methods and compositions for reducing line wide roughness App 20050084793 - Yueh, Wang ; et al.	2005-04-21
Methods and compositions for providing photoresist with improved properties for contacting liquids App 20050084794 - Meagley, Robert P. ; et al.	2005-04-21
Photoresists with reduced outgassing for extreme ultraviolet lithography App 20050079438 - Cao, Heidi ; et al.	2005-04-14
Langmuir-blodgett chemically amplified photoresist Grant 6,864,192 - Liou , et al. March 8, 2	2005-03-08
Copolymers and photoresist compositions comprising same Grant 6,849,381 - Barclay , et al. February 1, 2	2005-02-01
Photoresist performance through control of polymer characteristics App 20040265734 - Yueh, Wang ; et al.	2004-12-30
Copolymers and photoresist compositions comprising same Grant 6,777,157 - Barclay , et al. August 17, 2	2004-08-17
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 6,680,159 - Barclay , et al. January 20, 2	2004-01-20
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same App 20030224282 - Barclay, George G. ; et al.	2003-12-04
Novel copolymers and photoresist compositions comprising same App 20030215742 - Barclay, George G. ; et al.	2003-11-20
Phenolic/alicyclic copolymers and photoresists App 20030207200 - Barclay, George G. ; et al.	2003-11-06
Polymer and photoresist compositions Grant 6,599,677 - Szmanda , et al. July 29, 2	2003-07-29
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same App 20030073030 - Barclay, George G. ; et al.	2003-04-17
Phenolic/alicyclic copolymers and photoresists Grant 6,492,086 - Barclay , et al. December 10, 2	2002-12-10
Polymer and photoresist compositions App 20020173680 - Szmanda, Charles R. ; et al.	2002-11-21
Polymer and photoresist compositions App 20020160302 - Szmanda, Charles R. ; et al.	2002-10-31
Polymer and photoresist compositions App 20020155380 - Szmanda, Charles R. ; et al.	2002-10-24
Polymer and photoresist compositions Grant 6,406,828 - Szmanda , et al. June 18, 2	2002-06-18
Novel monomers, polymers, methods of synthesis thereof and photoresist compositions App 20020013448 - Barclay, George G. ; et al.	2002-01-31
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same Grant 6,306,554 - Barclay , et al. October 23, 2	2001-10-23

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.