Yue; Duofeng

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yue; Duofeng.The latest application filed is for "single photomask high precision thin film resistor".

Company Profile

0.13.16

Yue; Duofeng - Plano TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Single photomask high precision thin film resistor Grant 9,842,895 - Hao , et al. December 12, 2	2017-12-12
Single Photomask High Precision Thin Film Resistor App 20160197135 - HAO; Pinghai ; et al.	2016-07-07
Single photomask high precision thin film resistor Grant 9,305,688 - Hao , et al. April 5, 2	2016-04-05
Single Photomask High Precision Thin Film Resistor App 20140184381 - HAO; PingHai ; et al.	2014-07-03
High Density Plasma Dielectric Desposition For Void Free Gap Fill App 20100041241 - GALLEGOS; Joseph A. ; et al.	2010-02-18
Capacitor Formed In Interlevel Dielectric Layer App 20100032801 - Jacobs; Jarvis Benjamin ; et al.	2010-02-11
Nickel alloy silicide including indium and a method of manufacture therefor Grant 7,511,350 - Chen , et al. March 31, 2	2009-03-31
Method for manufacturing a semiconductor device having silicided regions Grant 7,422,968 - Lu , et al. September 9, 2	2008-09-09
Method for implanter angle verification and calibration Grant 7,397,046 - Yue , et al. July 8, 2	2008-07-08
Nickel Alloy Silicide Including Indium and a Method of Manufacture Therefor App 20080128837 - Chen; Peijun J. ; et al.	2008-06-05
Nickel silicide including indium and a method of manufacture therefor Grant 7,355,255 - Chen , et al. April 8, 2	2008-04-08
Nickel alloy silicide including indium and a method of manufacture therefor Grant 7,344,985 - Chen , et al. March 18, 2	2008-03-18
Contact resistance reduction by new barrier stack process Grant 7,256,121 - Yue , et al. August 14, 2	2007-08-14
Nickel silicide including indium and a method of manufacture therefor App 20070141840 - Chen; Peijun J. ; et al.	2007-06-21
Nickel silicide including indium and a method of manufacture therefor Grant 7,211,516 - Chen , et al. May 1, 2	2007-05-01
Metal-halogen physical vapor deposition for semiconductor device defect reduction Grant 7,208,398 - Chen , et al. April 24, 2	2007-04-24
Integrated circuit metal silicide method Grant 7,208,409 - Lu , et al. April 24, 2	2007-04-24
Metal silicide induced lateral excessive encroachment reduction by silicon <110> channel stuffing Grant 7,199,032 - Yue , et al. April 3, 2	2007-04-03
Nickel Alloy Silicide Including Indium And A Method Of Manufacture Therefor App 20070049022 - Chen; Peijun J. ; et al.	2007-03-01
Nickel silicide including indium and a method of manufacture therefor App 20060223295 - Chen; Peijun J. ; et al.	2006-10-05
Method for implanter angle verification and calibration App 20060138355 - Yue; Duofeng ; et al.	2006-06-29
Contact resistance reduction by new barrier stack process App 20060121724 - Yue; Duofeng ; et al.	2006-06-08
Silicide method for CMOS integrated circuits Grant 7,029,967 - Zhao , et al. April 18, 2	2006-04-18
Method for reducing metal silicide excessive encroachment defects in the manufacture of a semiconductor device having silicided source/drain regions App 20060024938 - Yue; Duofeng ; et al.	2006-02-02
Metal silicide induced lateral excessive encroachment reduction by silicon <110> channel stuffing App 20060024935 - Yue; Duofeng ; et al.	2006-02-02
Method for manufacturing a semiconductor device having silicided regions App 20060024882 - Lu; Jiong-Ping ; et al.	2006-02-02
Silicide method for CMOS integrated circuits App 20060019478 - Zhao; Song ; et al.	2006-01-26
Metal-halogen physical vapor deposition for semiconductor device defect reduction App 20050208762 - Chen, Peijun J. ; et al.	2005-09-22
Integrated circuit metal silicide method App 20050208764 - Lu, Jiong-Ping ; et al.	2005-09-22

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