Yuda; Katsuhisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yuda; Katsuhisa.The latest application filed is for "remote plasma apparatus for processing substrate with two types of gases".

Company Profile

0.15.20

Yuda; Katsuhisa - Tokyo JP
Yuda, Katsuhisa - Minato-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Vacuum processing apparatus Grant 7,981,216 - Ishibashi , et al. July 19, 2	2011-07-19
Remote Plasma Apparatus For Processing Substrate With Two Types Of Gases App 20100170442 - YUDA; Katsuhisa ; et al.	2010-07-08
Remote plasma apparatus for processing substrate with two types of gases Grant 7,709,063 - Yuda , et al. May 4, 2	2010-05-04
Method for manufacturing a thin-film transistor Grant 7,585,708 - Satou , et al. September 8, 2	2009-09-08
Method for Thin Film Formation App 20090202721 - Nogami; Hiroshi ; et al.	2009-08-13
CVD system and substrate cleaning method App 20080305275 - Ichikawa; Kazuo ; et al.	2008-12-11
Remote plasma apparatus for processing substrate with two types of gases Grant 7,392,759 - Yuda , et al. July 1, 2	2008-07-01
CVD system and substrate cleaning method App 20080044589 - Ichikawa; Kazuo ; et al.	2008-02-21
Remote Plasma Apparatus For Processing Substrate With Two Types Of Gases App 20070110918 - Yuda; Katsuhisa ; et al.	2007-05-17
Method for manufacturing a thin-film transistor App 20070045624 - Satou; Yoshinobu ; et al.	2007-03-01
Thin film transistor formed on a transparent substrate Grant 7,119,363 - Satou , et al. October 10, 2	2006-10-10
Method of forming silicon oxide film and forming apparatus thereof Grant 7,067,436 - Yuda , et al. June 27, 2	2006-06-27
Vacuum Processing Apparatus App 20050217576 - Ishibashi, Keiji ; et al.	2005-10-06
Remote plasma apparatus for processing substrate with two types of gases App 20050087140 - Yuda, Katsuhisa ; et al.	2005-04-28
Remote plasma apparatus for processing substrate with two types of gases Grant 6,851,384 - Yuda , et al. February 8, 2	2005-02-08
Thin film transistor formed on a transparent substrate App 20050012098 - Satou, Yoshinobu ; et al.	2005-01-20
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film Grant 6,830,786 - Yuda , et al. December 14, 2	2004-12-14
Thin film transistor formed on a transparent substrate Grant 6,822,263 - Satou , et al. November 23, 2	2004-11-23
Method of forming silicon oxide film and forming apparatus thereof App 20040198071 - Yuda, Katsuhisa ; et al.	2004-10-07
Plasma CVD apparatus for large area CVD film Grant 6,779,483 - Yuda , et al. August 24, 2	2004-08-24
Plasma CVD apparatus for large area CVD film App 20040083967 - Yuda, Katsuhisa ; et al.	2004-05-06
Method of manufacturing thin film transistor Grant 6,703,267 - Tanabe , et al. March 9, 2	2004-03-09
Plasma CVD apparatus for large area CVD film Grant 6,663,715 - Yuda , et al. December 16, 2	2003-12-16
Thin film transistor formed on a transparent substrate App 20030201440 - Satou, Yoshinobu ; et al.	2003-10-30
Chemical vapor deposition method Grant 6,537,911 - Ko , et al. March 25, 2	2003-03-25
Method of manufacturing thin film transistor App 20030013239 - Tanabe, Hiroshi ; et al.	2003-01-16
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film App 20020182343 - Yuda, Katsuhisa ; et al.	2002-12-05
Chemical vapor deposition method App 20020110998 - Ko, Sang-Tae ; et al.	2002-08-15
Method and apparatus for depositing a silicon oxide film App 20020090455 - Ikemoto, Manabu ; et al.	2002-07-11
Method of manufacturing thin film transistor App 20020072158 - Tanabe, Hiroshi ; et al.	2002-06-13
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film Grant 6,383,299 - Yuda , et al. May 7, 2	2002-05-07
Method of forming silicon oxide film and forming apparatus thereof App 20020006478 - Yuda, Katsuhisa ; et al.	2002-01-17
Remote plasma apparatus for processing sustrate with two types of gases App 20020000202 - Yuda, Katsuhisa ; et al.	2002-01-03
Method of manufacturing thin film transistor Grant 6,258,638 - Tanabe , et al. July 10, 2	2001-07-10
Plasma CVD apparatus and plasma CVD method App 20010003014 - Yuda, Katsuhisa	2001-06-07

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