| Patent | Date |
|---|
Blocker plate for use in a substrate process chamber
Grant 11,421,322 - Yuan , et al. August 23, 2 | 2022-08-23 |
Apparatus For Increasing Flux From An Ampoule
App 20210308703 - Choi; Kenric ; et al. | 2021-10-07 |
Remote Plasma Cleaning Of Chambers For Electronics Manufacturing Systems
App 20210305028 - Guo; Yuanhong ; et al. | 2021-09-30 |
Support Assembly
App 20210225640 - Kao; Chien-Teh ; et al. | 2021-07-22 |
Apparatus for increasing flux from an ampoule
Grant 11,059,061 - Choi , et al. July 13, 2 | 2021-07-13 |
Gas Distribution Ceramic Heater For Deposition Chamber
App 20210176831 - LEI; Pingyan ; et al. | 2021-06-10 |
High Temperature Dual Chamber Showerhead
App 20210130956 - LEI; Pingyan ; et al. | 2021-05-06 |
Methods And Apparatus For Dual Channel Showerheads
App 20210032753 - RAVI; Jallepally ; et al. | 2021-02-04 |
Substrate support plate with improved lift pin sealing
Grant 10,857,655 - Cuvalci , et al. December 8, 2 | 2020-12-08 |
Apparatus and methods to remove residual precursor inside gas lines post-deposition
Grant 10,752,990 - Yao , et al. A | 2020-08-25 |
Method and Apparatus for cleaning a substrate
App 20200230782 - AGARWAL; Pulkit ; et al. | 2020-07-23 |
Support Assembly
App 20200006054 - KAO; Chien-Teh ; et al. | 2020-01-02 |
Blocker Plate For Use In A Substrate Process Chamber
App 20190382895 - YUAN; XIAOXIONG ; et al. | 2019-12-19 |
Blocker plate for use in a substrate process chamber
Grant 10,508,339 - Yuan , et al. Dec | 2019-12-17 |
Atomic layer deposition chamber with thermal lid
Grant 10,407,771 - Cui , et al. Sept | 2019-09-10 |
Substrate Processing Chamber Having Heated Showerhead Assembly
App 20190078210 - GUNGOR; FARUK ; et al. | 2019-03-14 |
Blocker Plate For Use In A Substrate Process Chamber
App 20180347043 - YUAN; XIAOXIONG ; et al. | 2018-12-06 |
Apparatus for Increasing Flux from an Ampoule
App 20180250695 - Choi; Kenric ; et al. | 2018-09-06 |
Substrate support with multi-piece sealing surface
Grant 9,916,994 - Cuvalci , et al. March 13, 2 | 2018-03-13 |
Reflective deposition rings and substrate processing chambers incorporating same
Grant 9,905,443 - Subramani , et al. February 27, 2 | 2018-02-27 |
Substrate support with multiple heating zones
Grant 9,888,528 - Matsushita , et al. February 6, 2 | 2018-02-06 |
Rotatable heated electrostatic chuck
Grant 9,853,579 - Subramani , et al. December 26, 2 | 2017-12-26 |
Apparatus for variable substrate temperature control
Grant 9,783,889 - Tzu , et al. October 10, 2 | 2017-10-10 |
Apparatus And Methods To Remove Residual Precursor Inside Gas Lines Post-Deposition
App 20170275754 - Yao; Daping ; et al. | 2017-09-28 |
Substrate support for substrate backside contamination control
Grant 9,490,150 - Tzu , et al. November 8, 2 | 2016-11-08 |
Methods and Apparatus for Cleaning a Substrate
App 20160322239 - AGARWAL; Pulkit ; et al. | 2016-11-03 |
Substrate Support With Multiple Heating Zones
App 20160192444 - MATSUSHITA; TOMOHARU ; et al. | 2016-06-30 |
Atomic Layer Deposition Chamber With Thermal Lid
App 20160097119 - CUI; ANQING ; et al. | 2016-04-07 |
Substrate Support With More Uniform Edge Purge
App 20160002778 - RAVI; JALLEPALLY ; et al. | 2016-01-07 |
Gas distribution system
Grant 9,206,512 - Nguyen , et al. December 8, 2 | 2015-12-08 |
Method And Apparatus For Improving Gas Flow In A Substrate Processing Chamber
App 20150345019 - YUAN; XIAOXIONG ; et al. | 2015-12-03 |
Rotatable Heated Electrostatic Chuck
App 20150170952 - SUBRAMANI; ANANTHA K. ; et al. | 2015-06-18 |
Apparatuses and methods for atomic layer deposition
Grant 9,017,776 - Lam , et al. April 28, 2 | 2015-04-28 |
Process chamber lid design with built-in plasma source for short lifetime species
Grant 9,004,006 - Kao , et al. April 14, 2 | 2015-04-14 |
Methods and apparatus for thermal based substrate processing with variable temperature capability
Grant 08920564 - | 2014-12-30 |
Methods and apparatus for thermal based substrate processing with variable temperature capability
Grant 8,920,564 - Tzu , et al. December 30, 2 | 2014-12-30 |
Substrate Support Plate With Improved Lift Pin Sealing
App 20140265097 - CUVALCI; OLKAN ; et al. | 2014-09-18 |
Substrate Support With Multi-piece Sealing Surface
App 20140251207 - CUVALCI; OLKAN ; et al. | 2014-09-11 |
Heated Substrate Support With Flatness Control
App 20140251214 - CUVALCI; OLKAN ; et al. | 2014-09-11 |
Temperature controlled lid assembly for tungsten nitride deposition
Grant 8,821,637 - Gelatos , et al. September 2, 2 | 2014-09-02 |
Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
App 20140174362 - Kao; Chien-Teh ; et al. | 2014-06-26 |
Apparatuses and methods for atomic layer deposition
Grant 8,747,556 - Lam , et al. June 10, 2 | 2014-06-10 |
Apparatuses And Methods For Atomic Layer Deposition
App 20140087091 - Lam; Hyman W.H. ; et al. | 2014-03-27 |
Multi Chamber Processing System
App 20140076234 - KAO; Chien-Teh ; et al. | 2014-03-20 |
Substrate Support For Substrate Backside Contamination Control
App 20140008349 - TZU; GWO-CHUAN ; et al. | 2014-01-09 |
Apparatus For Variable Substrate Temperature Control
App 20130247826 - TZU; GWO-CHUAN ; et al. | 2013-09-26 |
Reflective Deposition Rings And Substrate Processing Chambers Incorporting Same
App 20130055952 - SUBRAMANI; ANANTHA K. ; et al. | 2013-03-07 |
Gas Distribution System
App 20120325149 - NGUYEN; HANH D. ; et al. | 2012-12-27 |
Apparatuses and methods for atomic layer deposition
Grant 8,293,015 - Lam , et al. October 23, 2 | 2012-10-23 |
Chemical precursor ampoule for vapor deposition processes
Grant 8,146,896 - Cuvalci , et al. April 3, 2 | 2012-04-03 |
Methods And Apparatus For Thermal Based Substrate Processing With Variable Temperature Capability
App 20120003388 - TZU; GWO-CHUAN ; et al. | 2012-01-05 |
Removal Of Trapped Silicon With A Cleaning Gas
App 20110274836 - Le; Dung Huu ; et al. | 2011-11-10 |
Process Chamber Lid Design With Built-in Plasma Source For Short Lifetime Species
App 20110265721 - Kao; Chien-Teh ; et al. | 2011-11-03 |
Vortex chamber lids for atomic layer deposition
Grant 7,780,789 - Wu , et al. August 24, 2 | 2010-08-24 |
Chemical Precursor Ampoule For Vapor Deposition Processes
App 20100112215 - CUVALCI; OLKAN ; et al. | 2010-05-06 |
Temperature Controlled Lid Assembly For Tungsten Nitride Deposition
App 20080202425 - Gelatos; Avgerinos V. ; et al. | 2008-08-28 |
Process For Tungsten Nitride Deposition By A Temperature Controlled Lid Assembly
App 20080206987 - Gelatos; Avgerinos V. ; et al. | 2008-08-28 |
Vortex Chamber Lids For Atomic Layer Deposition
App 20080107809 - Wu; Dien-Yeh ; et al. | 2008-05-08 |
Vortex Chamber Lids For Atomic Layer Deposition
App 20080102203 - Wu; Dien-Yeh ; et al. | 2008-05-01 |
Vortex Chamber Lids For Atomic Layer Deposition
App 20080102208 - Wu; Dien-Yeh ; et al. | 2008-05-01 |
Apparatus for generating plasma by RF power
App 20060130971 - Chang; Yu ; et al. | 2006-06-22 |
Ceramic substrate support
Grant 6,730,175 - Yudovsky , et al. May 4, 2 | 2004-05-04 |
Cyclical layer deposition system
App 20040065255 - Yang, Michael X. ; et al. | 2004-04-08 |
Lid assembly for a processing system to facilitate sequential deposition techniques
Grant 6,660,126 - Nguyen , et al. December 9, 2 | 2003-12-09 |
Multi-zone resistive heater
Grant 6,617,553 - Ho , et al. September 9, 2 | 2003-09-09 |
Ceramic substrate support
App 20030136520 - Yudovsky, Joseph ; et al. | 2003-07-24 |
Chamber hardware design for titanium nitride atomic layer deposition
App 20030116087 - Nguyen, Anh N. ; et al. | 2003-06-26 |
Multi-zone resistive heater
App 20030062359 - Ho, Henry ; et al. | 2003-04-03 |
Chemical vapor deposition chamber
App 20030019428 - Ku, Vincent W. ; et al. | 2003-01-30 |
.method Of Cvd Titanium Nitride Film Deposition For Increased Titanium Nitride Film Uniformity
App 20030017268 - Hu, Jianhua ; et al. | 2003-01-23 |
Method of reducing particle density in a cool down chamber
App 20030013312 - Wang, Hougong ; et al. | 2003-01-16 |
Ceramic substrate support
Grant 6,494,955 - Lei , et al. December 17, 2 | 2002-12-17 |
Lid assembly for a processing system to facilitate sequential deposition techniques
App 20020121342 - Nguyen, Anh N. ; et al. | 2002-09-05 |
Processing chamber and method of distributing process fluids therein to facilitate sequential deposition of films
App 20020121241 - Nguyen, Anh N. ; et al. | 2002-09-05 |
Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces
Grant 6,302,965 - Umotoy , et al. October 16, 2 | 2001-10-16 |
Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor deposition
Grant 6,299,692 - Ku , et al. October 9, 2 | 2001-10-09 |
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