Yu; Shang-Yuan
Patent Applications and Registrations
Patent applications and USPTO patent grants for Yu; Shang-Yuan.The latest application filed is for "system for storing chemical liquid and method for adjusting gas concentration in chemical liquid".
- Yu; Shang-Yuan - Hsinchu TW
- YU; Shang-Yuan - Hsinchu City TW
| Patent | Date |
|---|---|
| Apparatus and method of removing photoresist layer Grant 11,090,696 - Chang , et al. August 17, 2 | 2021-08-17 |
| System For Storing Chemical Liquid And Method For Adjusting Gas Concentration In Chemical Liquid App 20210077958 - KUO; Chun-Yu ; et al. | 2021-03-18 |
| Apparatus And Method Of Removing Photoresist Layer App 20200094298 - CHANG; Jui-Chuan ; et al. | 2020-03-26 |
| Single wafer cleaning tool with H.sub.2SO.sub.4 recycling Grant 10,510,527 - Hsiao , et al. Dec | 2019-12-17 |
| Semiconductor apparatus and method of removing photoresist layer on substrate Grant 10,486,204 - Chang , et al. Nov | 2019-11-26 |
| Photoresist Removal App 20180047580 - YU; Shang-Yuan ; et al. | 2018-02-15 |
| Photoresist removal Grant 9,805,946 - Yu , et al. October 31, 2 | 2017-10-31 |
| Wafer cleaning Grant 9,781,994 - Yu , et al. October 10, 2 | 2017-10-10 |
| Mechanisms for wafer cleaning Grant 9,349,617 - Yu , et al. May 24, 2 | 2016-05-24 |
| Semiconductor Apparatus And Method Of Removing Photoresist Layer On Substrate App 20160129484 - CHANG; Jui-Chuan ; et al. | 2016-05-12 |
| Mechanisms For Wafer Cleaning App 20150144159 - YU; Shang-Yuan ; et al. | 2015-05-28 |
| Photoresist Removal App 20150064928 - Yu; Shang-Yuan ; et al. | 2015-03-05 |
| Single Wafer Cleaning Tool with H2SO4 Recycling App 20140216500 - Hsiao; Chien-Wen ; et al. | 2014-08-07 |
| Wafer Cleaning App 20140158155 - Yu; Shang-Yuan ; et al. | 2014-06-12 |
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