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Patent applications and USPTO patent grants for Yu; Keven.The latest application filed is for "method for etching euv material layers utilized to form a photomask".
Patent | Date |
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Method of silicon etch for trench sidewall smoothing Grant 9,159,574 - Yu , et al. October 13, 2 | 2015-10-13 |
Method for etching EUV material layers utilized to form a photomask Grant 8,778,574 - Yu , et al. July 15, 2 | 2014-07-15 |
Method For Etching Euv Material Layers Utilized To Form A Photomask App 20140154615 - Yu; Keven ;   et al. | 2014-06-05 |
Method Of Silicon Etch For Trench Sidewall Smoothing App 20140057446 - YU; Keven ;   et al. | 2014-02-27 |
Method For Etching An Euv Reflective Multi-material Layers Utilized To Form A Photomask App 20130092655 - Yu; Keven ;   et al. | 2013-04-18 |
Methods For In-situ Chamber Dry Clean In Photomask Plasma Etching Processing Chamber App 20130048606 - Mao; Zhigang ;   et al. | 2013-02-28 |
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