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name:-0.0064020156860352
name:-0.0051631927490234
name:-0.00057291984558105
You; Kai-Shyang Patent Filings

You; Kai-Shyang

Patent Applications and Registrations

Patent applications and USPTO patent grants for You; Kai-Shyang.The latest application filed is for "recess technique to embed flash memory in soi technology".

Company Profile
0.5.4
  • You; Kai-Shyang - Jhubei TW
  • You; Kai-Shyang - Zhubei TW
  • You; Kai-Shyang - Zhubei City TW
  • YOU; Kai-Shyang - Jhubei City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods to stop contact metal from extruding into replacement gates
Grant 9,620,620 - Teo , et al. April 11, 2
2017-04-11
Recess technique to embed flash memory in SOI technology
Grant 9,543,153 - Chuang , et al. January 10, 2
2017-01-10
Recess Technique To Embed Flash Memory In Soi Technology
App 20160020219 - Chuang; Harry-Hak-Lay ;   et al.
2016-01-21
Methods To Stop Contact Metal From Extruding Into Replacement Gates
App 20130323919 - TEO; Lee-Wee ;   et al.
2013-12-05
Structures and methods to stop contact metal from extruding into replacement gates
Grant 8,525,270 - Teo , et al. September 3, 2
2013-09-03
Method and device with gate structure formed over the recessed top portion of the isolation structure
Grant 8,329,521 - Chuang , et al. December 11, 2
2012-12-11
Method And Apparatus For Improving Gate Contact
App 20120001259 - Chuang; Harry Hak-Lay ;   et al.
2012-01-05
Novel Structures And Methods To Stop Contact Metal From Extruding Into Replacement Gates
App 20110210403 - TEO; Lee-Wee ;   et al.
2011-09-01

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