You; Jan-Wen

Patent Applications and Registrations

Patent applications and USPTO patent grants for You; Jan-Wen.The latest application filed is for "method and system for identifying lens aberration sensitive patterns in an integrated circuit chip".

Company Profile

0.9.9

You; Jan-Wen - Jhongli TW
You; Jan-Wen - Jhongli City TW
You; Jan-Wen - Jungli TW
You; Jan-Wen - Taoyuang TW
You, Jan-Wen - Jungli City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip Grant 7,643,976 - Shin , et al. January 5, 2	2010-01-05
Method and system for enhancing image resolution using a modification vector Grant 7,474,788 - Chang , et al. January 6, 2	2009-01-06
Method and System for Identifying Lens Aberration Sensitive Patterns in an Integrated Circuit Chip App 20070203680 - Shin; Jaw-Jung ; et al.	2007-08-30
Method for improving the critical dimension uniformity of patterned features on wafers Grant 7,234,128 - Gau , et al. June 19, 2	2007-06-19
Lithography process to reduce interference App 20070087291 - Gau; Tsai-Sheng ; et al.	2007-04-19
Phase shift assignments for alternate PSM Grant 7,175,941 - Shin , et al. February 13, 2	2007-02-13
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era Grant 7,131,102 - Dai , et al. October 31, 2	2006-10-31
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era Grant 7,036,108 - Dai , et al. April 25, 2	2006-04-25
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA Grant 7,013,453 - Dai , et al. March 14, 2	2006-03-14
Method and system for enhancing image resolution App 20060050965 - Chang; Shih-Ming ; et al.	2006-03-09
Method of defining forbidden pitches for a lithography exposure tool Grant 6,973,636 - Shin , et al. December 6, 2	2005-12-06
Method of defining forbidden pitches for a lithography exposure tool App 20050086629 - Shin, Jaw-Jung ; et al.	2005-04-21
Method for improving the critical dimension uniformity of patterned features on wafers App 20050076323 - Gau, Tsai-Sheng ; et al.	2005-04-07
Phase shift assignments for alternate PSM App 20050053846 - Shin, Jaw-Jung ; et al.	2005-03-10
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era App 20040168147 - Dai, Chang-Ming ; et al.	2004-08-26
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA App 20040168146 - Dai, Chang-Ming ; et al.	2004-08-26
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era App 20040161679 - Dai, Chang-Ming ; et al.	2004-08-19
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era Grant 6,711,732 - Dai , et al. March 23, 2	2004-03-23

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