loadpatents
name:-0.013983964920044
name:-0.010142087936401
name:-0.00046014785766602
Yoshimura; Nakaatsu Patent Filings

Yoshimura; Nakaatsu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoshimura; Nakaatsu.The latest application filed is for "method for forming resist under layer film, pattern forming method and composition for resist under layer film".

Company Profile
0.11.11
  • Yoshimura; Nakaatsu - Tokyo JP
  • Yoshimura; Nakaatsu - Mie JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for forming resist under layer film, pattern forming method and composition for resist under layer film
Grant 8,691,496 - Konno , et al. April 8, 2
2014-04-08
Pattern-forming method
Grant 8,663,905 - Yoshimura , et al. March 4, 2
2014-03-04
Method For Forming Resist Under Layer Film, Pattern Forming Method And Composition For Resist Under Layer Film
App 20130004900 - Konno; Yousuke ;   et al.
2013-01-03
Composition for forming resist lower layer film
Grant 8,334,338 - Yoshimura , et al. December 18, 2
2012-12-18
Pattern forming method
Grant 8,288,073 - Konno , et al. October 16, 2
2012-10-16
Composition For Forming Resist Lower Layer Film
App 20110251323 - Yoshimura; Nakaatsu ;   et al.
2011-10-13
Composition for forming lower layer film and pattern forming method
Grant 7,749,681 - Yoshimura , et al. July 6, 2
2010-07-06
Composition for forming antireflection film, layered product, and method of forming resist pattern
Grant 7,709,182 - Yoshimura , et al. May 4, 2
2010-05-04
Composition For Resist Under Layer Film Formation And Method For Pattern Formation
App 20100081082 - Yoshimura; Nakaatsu ;   et al.
2010-04-01
Method For Resist Under Layer Film Formation, Composition For Resist Under Layer Film For Use In The Method, And Method For Pattern Formation
App 20100028802 - Konno; Yousuke ;   et al.
2010-02-04
Composition For Forming Lower Layer Film And Pattern Forming Method
App 20090098486 - Yoshimura; Nakaatsu ;   et al.
2009-04-16
Composition for forming antireflection film, laminate, and method for forming resist pattern
Grant 7,514,205 - Yoshimura , et al. April 7, 2
2009-04-07
Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern
App 20080124524 - Yoshimura; Nakaatsu ;   et al.
2008-05-29
Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof
Grant 7,169,327 - Ito , et al. January 30, 2
2007-01-30
Composition for photocatalyst coating and coating film
App 20060264525 - Ohwaki; Takeshi ;   et al.
2006-11-23
Composition for forming antireflection film, laminate, and method for forming resist pattern
App 20060223008 - Yoshimura; Nakaatsu ;   et al.
2006-10-05
Coating composition
App 20060070551 - Kanamori; Tarou ;   et al.
2006-04-06
Polymer composition, cured product, laminate and method for producing the cured product
Grant 6,737,169 - Shimada , et al. May 18, 2
2004-05-18
Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof
App 20030151032 - Ito, Nobuyuki ;   et al.
2003-08-14
Polymer composition, cured product, laminate and method for producing the cured product
App 20020146573 - Shimada, Mibuko ;   et al.
2002-10-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed