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name:-0.016949892044067
name:-0.0094888210296631
name:-0.00059199333190918
YOSHIKAWA; Tetsuya Patent Filings

YOSHIKAWA; Tetsuya

Patent Applications and Registrations

Patent applications and USPTO patent grants for YOSHIKAWA; Tetsuya.The latest application filed is for "anomaly determination apparatus".

Company Profile
0.10.14
  • YOSHIKAWA; Tetsuya - Toyota-shi JP
  • Yoshikawa; Tetsuya - Takasago JP
  • Yoshikawa; Tetsuya - Takasago-shi JP
  • Yoshikawa; Tetsuya - Hyogo JP
  • Yoshikawa; Tetsuya - Kobe JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Anomaly Determination Device For Power Transmission Device
App 20220042596 - BUNAZAWA; Hideaki ;   et al.
2022-02-10
Abnormality Determination Device
App 20220041174 - BUNAZAWA; Hideaki ;   et al.
2022-02-10
Anomaly Determination Apparatus
App 20220044502 - BUNAZAWA; Hideaki ;   et al.
2022-02-10
Device For Vehicle Including Power Transfer Device
App 20220042842 - BUNAZAWA; Hideaki ;   et al.
2022-02-10
Tire testing device
Grant 9,046,444 - Wakazono , et al. June 2, 2
2015-06-02
Tire Testing Device
App 20130233066 - Wakazono; Takehiko ;   et al.
2013-09-12
Tire testing machine and tire testing method
Grant 8,342,020 - Sumimoto , et al. January 1, 2
2013-01-01
Tire testing machine and method for testing tire
Grant 8,136,393 - Yoshikawa , et al. March 20, 2
2012-03-20
Tire Testing Machine And Method For Testing Tire
App 20110000292 - Yoshikawa; Tetsuya ;   et al.
2011-01-06
Tire Testing Machine And Tire Testing Method
App 20090308156 - Sumimoto; Yu ;   et al.
2009-12-17
Method for high-pressure processing
Grant 7,520,938 - Sakashita , et al. April 21, 2
2009-04-21
High pressure processing method and apparatus
Grant 7,513,265 - Yoshikawa , et al. April 7, 2
2009-04-07
Method for fabricating copper-based interconnections for semiconductor device
Grant 7,335,596 - Onishi , et al. February 26, 2
2008-02-26
Process and composition for removing residues from the microstructure of an object
Grant 7,220,714 - Masuda , et al. May 22, 2
2007-05-22
Method for fabricating copper-based interconnections for semiconductor device
App 20060019496 - Onishi; Takashi ;   et al.
2006-01-26
Method for forming aerial metallic wiring on semiconductor substrate
Grant 6,916,735 - Fujikawa , et al. July 12, 2
2005-07-12
Method for high-pressure processing
App 20050051194 - Sakashita, Yoshihiko ;   et al.
2005-03-10
Cleaning apparatus
App 20040226588 - Onishi, Takashi ;   et al.
2004-11-18
High pressure processing method and apparatus
App 20040123484 - Yoshikawa, Tetsuya ;   et al.
2004-07-01
Process and composition for removing residues from the microstructure of an object
App 20030217764 - Masuda, Kaoru ;   et al.
2003-11-27
Method for forming aerial metallic wiring on semiconductor substrate
App 20030077892 - Fujikawa, Takao ;   et al.
2003-04-24
Vacuum arc vapor deposition device having electrode switching means
Grant 5,103,766 - Yoshikawa , et al. April 14, 1
1992-04-14

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