Yoshikawa; Shigeru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoshikawa; Shigeru.The latest application filed is for "pump and sealing system".

Company Profile

2.9.14

Yoshikawa; Shigeru - Tokyo JP
Yoshikawa; Shigeru - Fujinomiya-shi JP
Yoshikawa; Shigeru - Hitachi JP
YOSHIKAWA; Shigeru - Hitachi-shi Ibaraki
Yoshikawa; Shigeru - Ibaraki JP
Yoshikawa; Shigeru - Mito-shi JP
Yoshikawa; Shigeru - Osaka JP
Yoshikawa; Shigeru - Tokorozawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sealing system Grant 11,441,571 - Yoshikawa , et al. September 13, 2	2022-09-13
Pump And Sealing System App 20200408219 - YOSHIKAWA; Shigeru ; et al.	2020-12-31
Sealing System App 20200309146 - YOSHIKAWA; Shigeru ; et al.	2020-10-01
Medical Device And Method For Manufacturing The Same App 20190321616 - Akahori; Yuta ; et al.	2019-10-24
Polishing liquid for CMP, polishing liquid set for CMP, and polishing method Grant 9,966,269 - Yoshikawa , et al. May 8, 2	2018-05-08
Bearing Apparatus And Pump App 20170276176 - HIRATA; Kazuya ; et al.	2017-09-28
Polishing Liquid For Cmp, Polishing Liquid Set For Cmp, And Polishing Method App 20170200617 - YOSHIKAWA; Shigeru ; et al.	2017-07-13
Polishing Liquid And Method For Polishing Substrate Using The Polishing Liquid App 20170133237 - Oota; Munehiro ; et al.	2017-05-11
Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the same Grant 8,591,612 - Enomoto , et al. November 26, 2	2013-11-26
Polishing solution for CMP and polishing method using the polishing solution Grant 8,592,317 - Satou , et al. November 26, 2	2013-11-26
Polishing Liquid And Method For Polishing Substrate Using The Polishing Liquid App 20130260558 - Oota; Munehiro ; et al.	2013-10-03
Cerium Oxide Slurry, Cerium Oxide Polishing Slurry And Method For Polishing Substrate Using The Same App 20130125476 - ENOMOTO; Kazuhiro ; et al.	2013-05-23
Chemical-mechanical Polishing Liquid, And Semiconductor Substrate Manufacturing Method And Polishing Method Using Said Polishing Liquid App 20120214307 - Yoshikawa; Shigeru ; et al.	2012-08-23
Polishing Solution For Cmp And Polishing Method Using The Polishing Solution App 20110275217 - Satou; Eiichi ; et al.	2011-11-10
Cerium Oxide Slurry, Cerium Oxide Polishing Slurry And Method For Polishing Substrate Using The Same App 20070093183 - Yoshikawa; Shigeru ; et al.	2007-04-26
Mail sorting and distributing transfer system Grant 6,979,793 - Shiibashi , et al. December 27, 2	2005-12-27
Mail sorter Grant 6,897,395 - Shiibashi , et al. May 24, 2	2005-05-24
Mail sorting and distributing transfer system App 20040016681 - Shiibashi, Ryosuke ; et al.	2004-01-29
Mail sorter App 20030226789 - Shiibashi, Ryosuke ; et al.	2003-12-11
First-in first-out article storage rack apparatus Grant 5,314,078 - Morikiyo , et al. May 24, 1	1994-05-24
Method and circuit for driving an ink jet printer Grant 4,491,851 - Mizuno , et al. January 1, 1	1985-01-01

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