YOSHIKAWA; Kouta

Patent Applications and Registrations

Patent applications and USPTO patent grants for YOSHIKAWA; Kouta.The latest application filed is for "heat source unit for a heat pump".

Company Profile

0.8.8

YOSHIKAWA; Kouta - Oostende BE
Yoshikawa; Kouta - Osaka JP
Yoshikawa; Kouta - Kawasaki N/A JP
Yoshikawa; Kouta - Osaka-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Heat Source Unit For A Heat Pump App 20220178557 - YOSHIKAWA; Kouta ; et al.	2022-06-09
Outdoor Unit For A Heat Pump App 20220136750 - YOSHIKAWA; Kouta ; et al.	2022-05-05
Fixing device having pressure release member supported reciprocably, and image forming apparatus equipped therewith Grant 9,170,536 - Yoshikawa , et al. October 27, 2	2015-10-27
Fixing Device And Image Forming Apparatus Equipped Therewith App 20140294442 - YOSHIKAWA; Kouta ; et al.	2014-10-02
Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device Grant 8,716,209 - Kobayashi , et al. May 6, 2	2014-05-06
Process for producing silicic coating, silicic coating and semiconductor device Grant 8,431,464 - Kobayashi , et al. April 30, 2	2013-04-30
Method of manufacturing semiconductor device Grant 8,404,584 - Imada , et al. March 26, 2	2013-03-26
Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device Grant 8,164,166 - Imada , et al. April 24, 2	2012-04-24
Method Of Manufacturing Semiconductor Device App 20110207319 - Imada; Tadahiro ; et al.	2011-08-25
Process For Producing Silicic Coating, Silicic Coating And Semiconductor Device App 20100133692 - Kobayashi; Yasushi ; et al.	2010-06-03
Agent For Post-etch Treatment Of Silicon Dielectric Film, Method Of Manufacturing Semiconductor Device, And Semiconductor Device App 20100007031 - Kobayashi; Yasushi ; et al.	2010-01-14
Interfacial Roughness Reducing Film, Wiring Layer, Semiconductor Device, And Method Of Manufacturing Semiconductor Device App 20090085170 - Imada; Tadahiro ; et al.	2009-04-02
Barber/beauty chair App 20060042001 - Takada; Tomoaki ; et al.	2006-03-02

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