Yoshifuku; Ryoichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoshifuku; Ryoichi.The latest application filed is for "manufacturing method of semiconductor device".

Company Profile

0.4.4

Yoshifuku; Ryoichi - Kanagawa JP
Yoshifuku; Ryoichi - Tokyo JP
Yoshifuku; Ryoichi - Hyogo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Manufacturing method of semiconductor device Grant 7,989,283 - Yamanari , et al. August 2, 2	2011-08-02
Manufacturing Method Of Semiconductor Device App 20110081753 - YAMANARI; Shinichi ; et al.	2011-04-07
Method of manufacturing semiconductor device having trench element-isolating structure Grant 6,825,118 - Maruyama , et al. November 30, 2	2004-11-30
Wiring layer dry etching method and semiconductor device manufacturing method Grant 6,740,598 - Kawai , et al. May 25, 2	2004-05-25
Method Of Manufacturing Semiconductor Device Having Trench Element-isolating Structure App 20040097046 - Maruyama, Takahiro ; et al.	2004-05-20
Method of manufacturing semiconductor device Grant 6,651,678 - Shintani , et al. November 25, 2	2003-11-25
Manufacturing method of semiconductor device App 20030096505 - Shintani, Kenji ; et al.	2003-05-22
Wiring layer dry etching method, semiconductor device manufacturing method, and semiconductor device obtained according to the method App 20020173150 - Kawai, Kenji ; et al.	2002-11-21

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