Yoshida; Tomosuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoshida; Tomosuke.The latest application filed is for "method for manufacturing a bonded soi wafer".

Company Profile

0.8.8

Yoshida; Tomosuke - Annaka JP
Yoshida; Tomosuke - Gunma JP
Yoshida; Tomosuke - Annaka-shi JP
Yoshida; Tomosuke - Gunma-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for manufacturing a bonded SOI wafer Grant 10,460,983 - Wakabayashi , et al. Oc	2019-10-29
Method For Manufacturing A Bonded Soi Wafer App 20170040210 - WAKABAYASHI; Taishi ; et al.	2017-02-09
Method For Manufacturing Silicon Epitaxial Wafer App 20150011079 - Yoshida; Tomosuke ; et al.	2015-01-08
Method for manufacturing silicon epitaxial wafer Grant 8,697,547 - Yoshida April 15, 2	2014-04-15
Method For Manufacturing Silicon Epitaxial Wafer App 20120231612 - Yoshida; Tomosuke	2012-09-13
Method of manufacturing silicon epitaxial wafer Grant 7,713,851 - Kume , et al. May 11, 2	2010-05-11
Method for Manufacturing Epitaxial Wafer and Epitaxial Wafer Manufactured by this Method App 20090038540 - Yoshida; Tomosuke ; et al.	2009-02-12
Silicon Epitaxial Wafer and Manufacturing Method Thereof App 20070269338 - Kume; Fumitaka ; et al.	2007-11-22
Method of manufacturing silicon epitaxial wafer App 20070243699 - Kume; Fumitaka ; et al.	2007-10-18
Susceptor, vapor phase growth apparatus, epitaxial wafer manufacturing apparatus, epitaxial wafer manufacturing method, and epitaxial wafer Grant 7,270,708 - Yoshida , et al. September 18, 2	2007-09-18
Silicon epitaxial wafer, and silicon epitaxial wafer manufacturing method App 20060281283 - Yoshida; Tomosuke ; et al.	2006-12-14
Susceptor gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer App 20040255843 - Yoshida, Tomosuke ; et al.	2004-12-23
Silicon wafer Grant 6,599,603 - Kato , et al. July 29, 2	2003-07-29
Method for producing an epitaxial silicon single crystal wafer and the epitaxial silicon single crystal wafer Grant 6,162,708 - Tamatsuka , et al. December 19, 2	2000-12-19
Method for evaluating oxygen concentrating in semiconductor silicon single crystal Grant 5,841,532 - Yoshida , et al. November 24, 1	1998-11-24

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