| Patent | Date |
|---|
Horizontal Gate-all-around Device Nanowire Air Gap Spacer Formation
App 20220173220 - SUN; Shiyu ; et al. | 2022-06-02 |
Integrated Dipole Flow For Transistor
App 20220115516 - Lin; Yongjing ; et al. | 2022-04-14 |
Horizontal gate all around device nanowire air gap spacer formation
Grant 11,282,936 - Sun , et al. March 22, 2 | 2022-03-22 |
Integrated dipole flow for transistor
Grant 11,245,022 - Lin , et al. February 8, 2 | 2022-02-08 |
Fluorine-free Tungsten Ald For Dielectric Selectivity Improvement
App 20210384036 - Fisher; Ilanit ; et al. | 2021-12-09 |
Fluorine-Free Tungsten ALD And Tungsten Selective CVD For Dielectrics
App 20210384035 - Fisher; Ilanit ; et al. | 2021-12-09 |
Method Of Dielectric Material Fill And Treatment
App 20210317580 - YOU; Shi ; et al. | 2021-10-14 |
Horizontal gate all around and FinFET device isolation
Grant 11,145,761 - Sun , et al. October 12, 2 | 2021-10-12 |
Method Of Cleaning A Structure And Method Of Depositing A Capping Layer In A Structure
App 20210233765 - YOSHIDA; Naomi ; et al. | 2021-07-29 |
Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors
Grant 11,075,276 - Lin , et al. July 27, 2 | 2021-07-27 |
Horizontal Gate All Around Device Nanowire Air Gap Spacer Formation
App 20200411656 - SUN; Shiyu ; et al. | 2020-12-31 |
Integrated Dipole Flow For Transistor
App 20200373404 - Lin; Yongjing ; et al. | 2020-11-26 |
Horizontal gate all around device nanowire air gap spacer formation
Grant 10,777,650 - Sun , et al. Sept | 2020-09-15 |
Tantalum-containing material removal
Grant 10,727,080 - Wang , et al. | 2020-07-28 |
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films
Grant 10,665,450 - Yang , et al. | 2020-05-26 |
Methods And Apparatus For N-type Metal Oxide Semiconductor (nmos) Metal Gate Materials Using Atomic Layer Deposition (ald) Proce
App 20200111885 - LIN; YONGJING ; et al. | 2020-04-09 |
Low thickness dependent work-function nMOS integration for metal gate
Grant 10,608,097 - Ma , et al. | 2020-03-31 |
Oxygen Free Deposition Of Platinum Group Metal Films
App 20200063263 - Yang; Yixiong ; et al. | 2020-02-27 |
Horizontal gate all around device isolation
Grant 10,573,719 - Sun , et al. Feb | 2020-02-25 |
Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD
Grant 10,553,425 - Kachian , et al. Fe | 2020-02-04 |
Horizontal Gate All Around And Finfet Device Isolation
App 20200035822 - SUN; Shiyu ; et al. | 2020-01-30 |
Horizontal gate all around and FinFET device isolation
Grant 10,490,666 - Sun , et al. Nov | 2019-11-26 |
Method for fabricating asymmetrical three dimensional device
Grant 10,381,465 - Sun , et al. A | 2019-08-13 |
Surface functionalization and passivation with a control layer
Grant 10,262,858 - Yoshida , et al. | 2019-04-16 |
Methods And Apparatus For Doping Engineering And Threshold Voltage Tuning By Integrated Deposition Of Titanium Nitride And Aluminum Films
App 20190057863 - YANG; YIXIONG ; et al. | 2019-02-21 |
Low Thickness Dependent Work-Function nMOS Integration For Metal Gate
App 20190019874 - Ma; Paul F. ; et al. | 2019-01-17 |
Tantalum-containing Material Removal
App 20190013211 - Wang; Xikun ; et al. | 2019-01-10 |
Method for fabricating junctions and spacers for horizontal gate all around devices
Grant 10,177,227 - Yoshida , et al. J | 2019-01-08 |
Aluminum content control of TiAIN films
Grant 10,170,321 - Zhang , et al. J | 2019-01-01 |
Low temperature atomic layer deposition of oxides on compound semiconductors
Grant 10,134,585 - Sardashti , et al. November 20, 2 | 2018-11-20 |
Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD)
Grant 10,109,534 - Brand , et al. October 23, 2 | 2018-10-23 |
Aluminum Content Control of TiAIN Films
App 20180269065 - Zhang; Wenyu ; et al. | 2018-09-20 |
Horizontal Gate All Around And Finfet Device Isolation
App 20180061978 - SUN; Shiyu ; et al. | 2018-03-01 |
Self-limiting And Saturating Chemical Vapor Deposition Of A Silicon Bilayer And Ald
App 20180019116 - KACHIAN; Jessica S. ; et al. | 2018-01-18 |
Horizontal gate all around and FinFET device isolation
Grant 9,865,735 - Sun , et al. January 9, 2 | 2018-01-09 |
Surface Functionalization And Passivation With A Control Layer
App 20170309479 - YOSHIDA; Naomi ; et al. | 2017-10-26 |
Horizontal Gate All Around Device Nanowire Air Gap Spacer Formation
App 20170309719 - SUN; Shiyu ; et al. | 2017-10-26 |
Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD
Grant 9,773,663 - Kachian , et al. September 26, 2 | 2017-09-26 |
Method for fabricating three dimensional device
Grant 9,748,364 - Sun , et al. August 29, 2 | 2017-08-29 |
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
Grant 9,748,354 - Tang , et al. August 29, 2 | 2017-08-29 |
Multi-threshold Voltage Structures With A Lanthanum Nitride Film And Methods Of Formation Thereof
App 20170179252 - TANG; Wei V. ; et al. | 2017-06-22 |
Methods and apparatus for forming horizontal gate all around device structures
Grant 9,673,277 - Brand , et al. June 6, 2 | 2017-06-06 |
Low Temperature Ald On Semiconductor And Metallic Surfaces
App 20170040158 - KACHIAN; Jessica S. ; et al. | 2017-02-09 |
Self-limiting And Saturating Chemical Vapor Deposition Of A Silicon Bilayer And Ald
App 20170040159 - KACHIAN; Jessica S. ; et al. | 2017-02-09 |
Horizontal Gate All Around Device Isolation
App 20170018624 - SUN; Shiyu ; et al. | 2017-01-19 |
Horizontal Gate All Around And Finfet Device Isolation
App 20160336405 - SUN; Shiyu ; et al. | 2016-11-17 |
Method for fabricating nanowires for horizontal gate all around devices for semiconductor applications
Grant 9,484,406 - Sun , et al. November 1, 2 | 2016-11-01 |
Method For Fabricating Three Dimensional Device
App 20160315176 - Sun; Shiyu ; et al. | 2016-10-27 |
Method For Fabricating Asymmetrical Three Dimensional Device
App 20160315177 - Sun; Shiyu ; et al. | 2016-10-27 |
Horizontal gate all around device isolation
Grant 9,460,920 - Sun , et al. October 4, 2 | 2016-10-04 |
Methods for removing carbon containing films
Grant 9,355,820 - Liu , et al. May 31, 2 | 2016-05-31 |
Methods And Apparatus For Forming Horizontal Gate All Around Device Structures
App 20160111495 - BRAND; ADAM ; et al. | 2016-04-21 |
Low Temperature Atomic Layer Deposition Of Oxides On Compound Semiconductors
App 20160056033 - Sardashti; Kasra ; et al. | 2016-02-25 |
MULTI-THRESHOLD VOLTAGE (Vt) WORKFUNCTION METAL BY SELECTIVE ATOMIC LAYER DEPOSITION (ALD)
App 20150262828 - BRAND; ADAM ; et al. | 2015-09-17 |
Metal gate structures for field effect transistors and method of fabrication
Grant 9,018,054 - Yoshida , et al. April 28, 2 | 2015-04-28 |
Methods For Removing Carbon Containing Films
App 20150072526 - LIU; WEI ; et al. | 2015-03-12 |
Metal gate structures for field effect transistors and method of fabrication
App 20140264483 - Yoshida; Naomi ; et al. | 2014-09-18 |
Amorphous carbon deposition method for improved stack defectivity
Grant 8,349,741 - Yu , et al. January 8, 2 | 2013-01-08 |
Amorphous Carbon Deposition Method For Improved Stack Defectivity
App 20120208374 - Yu; Hang ; et al. | 2012-08-16 |
Amorphous carbon deposition method for improved stack defectivity
Grant 8,227,352 - Yu , et al. July 24, 2 | 2012-07-24 |
Amorphous Carbon Deposition Method For Improved Stack Defectivity
App 20120015521 - Yu; Hang ; et al. | 2012-01-19 |
Test structure design for reliability test
Grant 7,365,529 - Yoshida , et al. April 29, 2 | 2008-04-29 |
System for automatically generating continuous developed still image from video image of inner wall of tubular object
Grant 7,324,137 - Akizuki , et al. January 29, 2 | 2008-01-29 |
Test Structure Design For Reliability Test
App 20070013363 - Yoshida; Naomi ; et al. | 2007-01-18 |
Test structure design for reliability test
Grant 7,119,571 - Yoshida , et al. October 10, 2 | 2006-10-10 |
State management device, state management system, and job processing system
App 20060150032 - Furukawa; Kouji ; et al. | 2006-07-06 |
Test structure design for reliability test
App 20060109022 - Yoshida; Naomi ; et al. | 2006-05-25 |
System for automatically generating continuous developed still image from video image of inner wall of tubular object
App 20050168593 - Akizuki, Naomichi ; et al. | 2005-08-04 |
Film deposition method and apparatus
Grant 6,852,626 - Wada , et al. February 8, 2 | 2005-02-08 |
Exhaust emission control catalyst element, catalyst structure, production method thereof, exhaust emission control apparatus and exhaust emission control method using the apparatus
Grant 6,833,117 - Kato , et al. December 21, 2 | 2004-12-21 |
Film deposition method and apparatus
Grant 6,488,984 - Wada , et al. December 3, 2 | 2002-12-03 |
Process for producing a denitration catalyst
Grant 5,294,584 - Yoshida , et al. March 15, 1 | 1994-03-15 |
| 