YOSHIDA; Akihisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for YOSHIDA; Akihisa.The latest application filed is for "apparatus for exhaust gas abatement under reduced pressure".

Company Profile

2.9.8

YOSHIDA; Akihisa - Nagaokakyo-shi Kyoto
Yoshida; Akihisa - Nagaokakyo JP
Yoshida; Akihisa - Kyoto JP
Yoshida, Akihisa - Koyoto-shi JP
Yoshida, Akihisa - Kyoto-shi JP
Yoshida; Akihisa - Hyogo JP
Yoshida; Akihisa - Neyagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus For Exhaust Gas Abatement Under Reduced Pressure App 20200122085 - MAEDA; Masashi ; et al.	2020-04-23
Apparatus for exhaust gas abatement under reduced pressure Grant 10,617,997 - Maeda , et al.	2020-04-14
Surface acoustic wave device and method for producing the same Grant 6,984,540 - Takase , et al. January 10, 2	2006-01-10
Surface acoustic wave device and method for producing the same App 20040095038 - Takase, Mitihiko ; et al.	2004-05-20
Method for surface treatment and system for fabricating semiconductor device App 20030153101 - Takase, Michihiko ; et al.	2003-08-14
Semiconductor laser and optical system having a collimator lens Grant 6,597,486 - Nakata , et al. July 22, 2	2003-07-22
Silicon structure, method for producing the same, and solar battery using the silicon structure App 20030106581 - Shibuya, Munehiro ; et al.	2003-06-12
Method and apparatus for activating semiconductor impurities Grant 6,577,386 - Yoshida , et al. June 10, 2	2003-06-10
Silicon structure, method for producing the same, and solar battery using the silicon structure Grant 6,518,494 - Shibuya , et al. February 11, 2	2003-02-11
Magnetoresistive element, method for manufacturing the same, and magnetic device using the same App 20020036876 - Kawawake, Yasuhiro ; et al.	2002-03-28
Semiconductor laser and optical system having a collimator lens App 20020008893 - Nakata, Naotaro ; et al.	2002-01-24
Method Of Producing Thin Semiconductor Film And Apparatus Therefor App 20020005159 - KITAGAWA, MASATOSHI ; et al.	2002-01-17
Method and apparatus for activating semiconductor impurities App 20010027001 - Yoshida, Akihisa ; et al.	2001-10-04
Substrate surface treatment method Grant 5,814,194 - Deguchi , et al. September 29, 1	1998-09-29
Method for forming silicon film and silicon film forming apparatus Grant 5,766,342 - Shibuya , et al. June 16, 1	1998-06-16
Method of fabrication of thin film transistors Grant 5,141,885 - Yoshida , et al. August 25, 1	1992-08-25
Plasma processing apparatus for large area ion irradiation Grant 4,859,908 - Yoshida , et al. August 22, 1	1989-08-22

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