loadpatents
name:-0.008746862411499
name:-0.010771036148071
name:-0.0037081241607666
Yori; Hanako Patent Filings

Yori; Hanako

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yori; Hanako.The latest application filed is for "semiconductor device and manufacturing method therefor, and resin composition for forming flexible resin layer".

Company Profile
3.9.8
  • Yori; Hanako - Tokyo JP
  • Yori; Hanako - Tsukuba JP
  • YORI; Hanako - Chiyoda-ku Tokyo
  • YORI; Hanako - Tsukuba-shi Ibaraki
  • Yori; Hanako - Hitachi N/A JP
  • Yori; Hanako - Ibaraki JP
  • Yori; Hanako - Hitachi-shi Ibaraki
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Resin film, and laminated film including base material film, resin film formed on base material film, and protective film attached to resin film
Grant 11,330,721 - Shibata , et al. May 10, 2
2022-05-10
Method for producing semiconductor device
Grant 11,147,166 - Shibata , et al. October 12, 2
2021-10-12
Semiconductor Device And Manufacturing Method Therefor, And Resin Composition For Forming Flexible Resin Layer
App 20200253059 - Kind Code
2020-08-06
Semiconductor device and manufacturing method therefor, and resin composition for forming flexible resin layer
Grant 10,674,612 - Shibata , et al.
2020-06-02
Photosensitive resin composition, photosensitive film, and method for forming resist pattern
Grant 10,324,375 - Iwashita , et al.
2019-06-18
Semiconductor Device And Manufacturing Method Therefor, And Resin Composition For Forming Flexible Resin Layer
App 20180288882 - SHIBATA; Tomoaki ;   et al.
2018-10-04
Semiconductor Device And Manufacturing Method Therefor, And Resin Composition For Forming Flexible Resin Layer
App 20170325336 - SHIBATA; Tomoaki ;   et al.
2017-11-09
Photosensitive Resin Composition, Photosensitive Film, And Method For Forming Resist Pattern
App 20150323867 - IWASHITA; Kenichi ;   et al.
2015-11-12
Photosensitive element, method for formation of resist pattern, and method for production of print circuit board
Grant 8,501,392 - Saitou , et al. August 6, 2
2013-08-06
Photocurable resin composition and a method for forming a pattern
Grant 8,288,079 - Ogino , et al. October 16, 2
2012-10-16
Photo-curable resin composition and a method for forming a pattern using the same
Grant 7,935,472 - Ogino , et al. May 3, 2
2011-05-03
Photosensitive Element, Method For Formation Of Resist Pattern, And Method For Production Of Print Circuit Board
App 20090297982 - Saitou; Manabu ;   et al.
2009-12-03
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
Grant 7,611,818 - Sawabe , et al. November 3, 2
2009-11-03
Photocurable resin composition and a method for forming a pattern
App 20070160937 - Ogino; Masahiko ;   et al.
2007-07-12
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
App 20070077514 - Sawabe; Ken ;   et al.
2007-04-05
Photo-curable resin composition and a method for forming a pattern using the same
App 20070065757 - Ogino; Masahiko ;   et al.
2007-03-22

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