Yoon; Kyong-Ho

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoon; Kyong-Ho.The latest application filed is for "hardmask composition having antireflective properties and method of patterning material on substrate using the same".

Company Profile

2.16.13

Yoon; Kyong-Ho - Uiwang-si N/A KR
- Uiwang-si KR
Yoon; Kyong Ho - Daejeon-si KR
Yoon; Kyong Ho - Daejeon N/A KR
Yoon; Kyong Ho - Daejeon Kwangyeok-si KR
Yoon; Kyong Ho - Seo-gu KR
Yoon; Kyong Ho - Kwangyeok-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same Grant 9,116,429 - Song , et al. August 25, 2	2015-08-25
Aromatic ring containing polymer, underlayer composition including the same, and associated methods Grant 8,697,341 - Yoon , et al. April 15, 2	2014-04-15
Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same Grant 08617792 -	2013-12-31
Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same Grant 8,617,792 - Cho , et al. December 31, 2	2013-12-31
Hardmask composition having antireflective properties and method of patterning material on substrate using the same Grant 8,445,187 - Yoon , et al. May 21, 2	2013-05-21
Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods Grant 8,420,289 - Kim , et al. April 16, 2	2013-04-16
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer Grant 8,263,321 - Yoon , et al. September 11, 2	2012-09-11
Polymer composition, hardmask composition having antireflective properties, and associated methods Grant 8,153,349 - Cheon , et al. April 10, 2	2012-04-10
Hardmask Composition Having Antireflective Properties And Method Of Patterning Material On Substrate Using The Same App 20110275019 - YOON; Kyong Ho ; et al.	2011-11-10
Aromatic Ring Containing Polymer, Underlayer Composition Including The Same, And Associated Methods App 20110229828 - YOON; Kyong-Ho ; et al.	2011-09-22
Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same Grant 7,981,594 - Yoon , et al. July 19, 2	2011-07-19
Resist Underlayer Polymer, Resist Underlayer Composition Including The Same, And Method Of Patterning Using The Same App 20110117501 - SONG; Jee Yun ; et al.	2011-05-19
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer App 20110097672 - Yoon; Kyong Ho ; et al.	2011-04-28
Aromatic Ring-containing Polymer For Resist Underlayer, Resist Underlayer Composition Including The Same, And Method Of Patterning Device Using The Same App 20110027722 - Cho; Sung-Wook ; et al.	2011-02-03
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer Grant 7,862,990 - Yoon , et al. January 4, 2	2011-01-04
Organosilane Polymers, Hardmask Compositions Including The Same And Methods Of Producing Semiconductor Devices Using Organosilane Hardmask Compositions App 20100320573 - Uh; Dong Seon ; et al.	2010-12-23
Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer Grant 7,659,051 - Yoon , et al. February 9, 2	2010-02-09
Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device Grant 7,655,386 - Hyung , et al. February 2, 2	2010-02-02
Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods App 20100021830 - Kim; Min Soo ; et al.	2010-01-28
Polymer composition, hardmask composition having antireflective properties, and associated methods App 20090176165 - Cheon; Hwan Sung ; et al.	2009-07-09
Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same App 20080305441 - YOON; Kyong Ho ; et al.	2008-12-11
Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer App 20080160460 - Yoon; Kyong Ho ; et al.	2008-07-03
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer App 20080160461 - Yoon; Kyong Ho ; et al.	2008-07-03
Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device App 20080153033 - Hyung; Kyung Hee ; et al.	2008-06-26
Organosilane Polymers, Hardmask Compositions Including The Same And Methods Of Producing Semiconductor Devices Using Organosilane Hardmask Compositions App 20070212886 - Uh; Dong Seon ; et al.	2007-09-13

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