Yoo; Ji Heum

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoo; Ji Heum.The latest application filed is for "alkali-soluble resin and negative-type photosensitive resin composition comprising the same".

Company Profile

0.13.10

Yoo; Ji Heum - Daejeon KR
Yoo; Ji-Heum - Daejeon Metropolitan KR
Yoo; Ji-Heum - Daejeon Metropolitan City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same Grant 8,951,713 - Kim , et al. February 10, 2	2015-02-10
Colored dispersion, photoresist composition and black matrix Grant 8,822,132 - Choi , et al. September 2, 2	2014-09-02
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Grant 8,535,874 - Kim , et al. September 17, 2	2013-09-17
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same App 20130130176 - Kim; Han Soo ; et al.	2013-05-23
Polymer resin compounds and photoresist composition including new polymer resin compounds Grant 8,361,696 - Lee , et al. January 29, 2	2013-01-29
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin Grant 8,357,483 - Kim , et al. January 22, 2	2013-01-22
Fluorene-based resin polymer and method for preparing thereof Grant 8,338,559 - Heo , et al. December 25, 2	2012-12-25
Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin Grant 8,323,533 - Lim , et al. December 4, 2	2012-12-04
Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins Grant 8,304,169 - Lim , et al. November 6, 2	2012-11-06
Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition Grant 8,252,879 - Kim , et al. August 28, 2	2012-08-28
Alkali-developable Resins, Method For Preparing The Same And Photosensitive Composition Comprising The Alkali-developable Resins App 20100323295 - Lim; Min-Young ; et al.	2010-12-23
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same App 20100201925 - Kim; Han Soo ; et al.	2010-08-12
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same App 20100196824 - Kim; Han Soo ; et al.	2010-08-05
Photosensitive Resin, Method For Preparing The Resin, Photosensitive Resin Composition And Cured Product Of The Resin Composition App 20100168266 - Lim; Min Young ; et al.	2010-07-01
Colored Dispersion, Photoresist Composition And Black Matrix App 20100104981 - Choi; Dong Chang ; et al.	2010-04-29
Polymer Resin Compounds And Photoresist Composition Including New Polymer Resin Compounds App 20100105793 - Lee; Keon-Woo ; et al.	2010-04-29
Photosensitive Resin Composition Comprising A Polymer Prepared By Using Macromonomer As Alkali Soluble Resin App 20100081089 - Kim; Han-Soo ; et al.	2010-04-01
Composition For Manufacturing Indurative Resin, Indurative Resin Manufactured By The Composition And Ink Composition Comprising The Resin App 20100051883 - Lim; Min-Young ; et al.	2010-03-04
Fluorene-based Resin Polymer And Method For Preparing Thereof App 20100029892 - Heo; Yoon-Hee ; et al.	2010-02-04

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