Yoo; Jeong Hyun
Patent Applications and Registrations
Patent applications and USPTO patent grants for Yoo; Jeong Hyun.The latest application filed is for "methods of removing residual polymers formed during a boron-doped amorphous carbon layer etch process".
- Yoo; Jeong Hyun - Gyeonggi-do KR
- Yoo; Jeong Hyun - Hwaseong-si KR
- YOO; Jeong-Hyun - Suncheon-si KR
| Patent | Date |
|---|---|
| Mask passivation using plasma Grant 9,418,867 - Kong , et al. August 16, 2 | 2016-08-16 |
| Methods of removing residual polymers formed during a boron-doped amorphous carbon layer etch process Grant 9,390,923 - Yoo , et al. July 12, 2 | 2016-07-12 |
| Method of etching a boron doped carbon hardmask Grant 9,287,124 - Kong , et al. March 15, 2 | 2016-03-15 |
| Methods Of Removing Residual Polymers Formed During A Boron-doped Amorphous Carbon Layer Etch Process App 20160005602 - YOO; JEONG HYUN ; et al. | 2016-01-07 |
| Mask Passivation Using Plasma App 20150200109 - Kong; Byungkook ; et al. | 2015-07-16 |
| Method Of Etching A Boron Doped Carbon Hardmask App 20150064914 - KONG; Byungkook ; et al. | 2015-03-05 |
| Method Of Analyzing Numeric Model For Metal Hydride Tank App 20140207387 - CHO; Sung-Wook ; et al. | 2014-07-24 |
| Method Of Calculating Numeric Model For Interpretation Of Metal Hydride Tank App 20140114626 - CHO; Sung-Wook ; et al. | 2014-04-24 |
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