Yoo; Do-Yul

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoo; Do-Yul.The latest application filed is for "overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key".

Company Profile

0.5.8

Yoo; Do-Yul - Seongnam-si KR
Yoo; Do-Yul - Gyeonggi-do KR
Yoo; Do-Yul - Sungnam-si KR
Yoo, Do-Yul - Seoul KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key App 20100315094 - Yoo; Do-Yul	2010-12-16
Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key Grant 7,804,596 - Yoo September 28, 2	2010-09-28
Photomask with overlay mark and method of fabricating semiconductor device Grant 7,732,105 - Yoo , et al. June 8, 2	2010-06-08
Photomask With Overlay Mark And Method Of Fabricating Semiconductor Device App 20080014511 - YOO; Do-Yul ; et al.	2008-01-17
Overlay mark for measuring and correcting alignment errors Grant 7,288,848 - Lee , et al. October 30, 2	2007-10-30
Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same Grant 7,236,245 - Yoo June 26, 2	2007-06-26
Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key App 20070077503 - Yoo; Do-Yul	2007-04-05
Overlay key, method of forming the overlay key, semiconductor device including the overlay key and method of manufacturing the semiconductor device App 20070063317 - Kim; Dae-Joung ; et al.	2007-03-22
Method of forming interconnection lines in a semiconductor device App 20050153539 - Shin, Hye-Soo ; et al.	2005-07-14
Overlay mark for measuring and correcting alignment errors App 20050110012 - Lee, Dong-Hun ; et al.	2005-05-26
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio Grant 6,841,338 - Lee , et al. January 11, 2	2005-01-11
Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same App 20050002034 - Yoo, Do-yul	2005-01-06
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio App 20030049565 - Lee, Dae-youp ; et al.	2003-03-13

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