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Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof
Grant 9,530,898 - Ganguly , et al. December 27, 2 | 2016-12-27 |
Post treatment methods for oxide layers on semiconductor devices
Grant 9,431,237 - Ma , et al. August 30, 2 | 2016-08-30 |
Method of improving oxide growth rate of selective oxidation processes
Grant 9,117,661 - Yokota , et al. August 25, 2 | 2015-08-25 |
Method and apparatus for single step selective nitridation
Grant 9,023,700 - Ganguly , et al. May 5, 2 | 2015-05-05 |
Semiconductor Devices Suitable For Narrow Pitch Applications And Methods Of Fabrication Thereof
App 20150102396 - GANGULY; UDAYAN ; et al. | 2015-04-16 |
Remote plasma radical treatment of silicon oxide
Grant 8,916,484 - Olsen , et al. December 23, 2 | 2014-12-23 |
Method And Apparatus For Single Step Selective Nitridation
App 20140342543 - GANGULY; Udayan ; et al. | 2014-11-20 |
Thermal reactor with improved gas flow distribution
Grant 8,888,916 - Tseng , et al. November 18, 2 | 2014-11-18 |
Remote Plasma Radical Treatment Of Silicon Oxide
App 20140227888 - OLSEN; CHRISTOPHER S. ; et al. | 2014-08-14 |
Method and apparatus for single step selective nitridation
Grant 8,748,259 - Ganguly , et al. June 10, 2 | 2014-06-10 |
Remote plasma radical treatment of silicon oxide
Grant 8,741,785 - Olsen , et al. June 3, 2 | 2014-06-03 |
Thermal Reactor With Improved Gas Flow Distribution
App 20140079376 - TSENG; Ming-Kuei (Michael) ; et al. | 2014-03-20 |
Method Of Improving Oxide Growth Rate Of Selective Oxidation Processes
App 20140057455 - YOKOTA; Yoshitaka ; et al. | 2014-02-27 |
Thermal reactor with improved gas flow distribution
Grant 8,608,853 - Tseng , et al. December 17, 2 | 2013-12-17 |
Method of improving oxide growth rate of selective oxidation processes
Grant 8,546,271 - Yokota , et al. October 1, 2 | 2013-10-01 |
Method of thermally treating silicon with oxygen
Grant 8,497,193 - Yokota , et al. July 30, 2 | 2013-07-30 |
Methods of forming oxide layers on substrates
Grant 8,492,292 - Yokota , et al. July 23, 2 | 2013-07-23 |
Methods for forming conformal oxide layers on semiconductor devices
Grant 8,435,906 - Tjandra , et al. May 7, 2 | 2013-05-07 |
Remote Plasma Radical Treatment Of Silicon Oxide
App 20130109164 - Olsen; Christopher S. ; et al. | 2013-05-02 |
Water cooled gas injector
Grant 8,409,353 - Yokota , et al. April 2, 2 | 2013-04-02 |
Methods for oxidation of a semiconductor device
Grant 8,207,044 - Mani , et al. June 26, 2 | 2012-06-26 |
Thermal Reactor With Improved Gas Flow Distribution
App 20120058648 - Tseng; Ming-Kuei (Michael) ; et al. | 2012-03-08 |
Water cooled gas injector
App 20120031332 - Yokota; Yoshitaka ; et al. | 2012-02-09 |
Thermal reactor with improved gas flow distribution
Grant 8,056,500 - Tseng , et al. November 15, 2 | 2011-11-15 |
Dual frequency low temperature oxidation of a semiconductor device
Grant 8,043,981 - Ma , et al. October 25, 2 | 2011-10-25 |
Method of thermally treating silicon with oxygen
App 20110250764 - Yokota; Yoshitaka ; et al. | 2011-10-13 |
Method Of Improving Oxide Growth Rate Of Selective Oxidation Processes
App 20110230060 - Yokota; Yoshitaka ; et al. | 2011-09-22 |
Methods For Oxidation Of A Semiconductor Device
App 20110217850 - MANI; RAJESH ; et al. | 2011-09-08 |
Method And Apparatus For Single Step Selective Nitridation
App 20110217834 - Ganguly; Udayan ; et al. | 2011-09-08 |
Thermal oxidation of silicon using ozone
Grant 7,972,441 - Yokota , et al. July 5, 2 | 2011-07-05 |
Method of improving oxide growth rate of selective oxidation processes
Grant 7,951,728 - Yokota , et al. May 31, 2 | 2011-05-31 |
Methods for oxidation of a semiconductor device
Grant 7,947,561 - Mani , et al. May 24, 2 | 2011-05-24 |
Apparatus and Methods for Cyclical Oxidation and Etching
App 20110061812 - Ganguly; Udayan ; et al. | 2011-03-17 |
Methods Of Forming Oxide Layers On Substrates
App 20100330814 - Yokota; Yoshitaka ; et al. | 2010-12-30 |
Post Treatment Methods for Oxide Layers on Semiconductor Devices
App 20100267248 - Ma; Kai ; et al. | 2010-10-21 |
Dual Frequency Low Temperature Oxidation of a Semiconductor Device
App 20100267247 - Ma; Kai ; et al. | 2010-10-21 |
Methods for Forming Conformal Oxide Layers on Semiconductor Devices
App 20100216317 - Tjandra; Agus S. ; et al. | 2010-08-26 |
Plasma And Thermal Anneal Treatment To Improve Oxidation Resistance Of Metal-containing Films
App 20100120245 - Tjandra; Agus Sofian ; et al. | 2010-05-13 |
Post Oxidation Annealing Of Low Temperature Thermal Or Plasma Based Oxidation
App 20090311877 - OLSEN; CHRISTOPHER S. ; et al. | 2009-12-17 |
Methods For Oxidation Of A Semiconductor Device
App 20090233453 - MANI; RAJESH ; et al. | 2009-09-17 |
Thermal Reactor With Improved Gas Flow Distribution
App 20090163042 - Tseng; Ming-Kuei (Michael) ; et al. | 2009-06-25 |
UV assisted thermal processing
Grant 7,547,633 - Ranish , et al. June 16, 2 | 2009-06-16 |
Method Of Improving Oxide Growth Rate Of Selective Oxidation Processes
App 20090081884 - YOKOTA; YOSHITAKA ; et al. | 2009-03-26 |
UV assisted thermal processing
App 20080067416 - Ranish; Joseph Michael ; et al. | 2008-03-20 |
Method of Thermally Oxidizing Silicon Using Ozone
App 20070026693 - YOKOTA; Yoshitaka ; et al. | 2007-02-01 |
Substrate processing platform allowing processing in different ambients
App 20060240680 - Yokota; Yoshitaka ; et al. | 2006-10-26 |
Thermal oxidation of silicon using ozone
App 20060223315 - Yokota; Yoshitaka ; et al. | 2006-10-05 |
Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD
Grant 6,713,127 - Subramony , et al. March 30, 2 | 2004-03-30 |
Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD
App 20030138562 - Subramony, Janardhanan Anand ; et al. | 2003-07-24 |
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