| Patent | Date |
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On-press Development Type Lithographic Printing Plate Precursor, Method For Preparing Lithographic Printing Plate, And Lithographic Printing Method
App 20220118753 - Yokokawa; Natsumi ; et al. | 2022-04-21 |
On-machine Development Type Planographic Printing Plate Precursor, Method For Preparing Planographic Printing Plate, And Planographic Printing Method
App 20220111629 - Enomoto; Kazuaki ; et al. | 2022-04-14 |
Lithographic Printing Plate Precursor, Method Of Preparing Lithographic Printing Plate, And Lithographic Printing Method
App 20210362529 - YOKOKAWA; Natsumi ; et al. | 2021-11-25 |
Planographic Printing Plate Precursor, Method Of Preparing Planographic Printing Plate, And Planographic Printing Method
App 20210356879 - Yokokawa; Natsumi ; et al. | 2021-11-18 |
Denture base coating composition, coating film-bearing denture base, plate denture, and method for producing coating film-bearing denture base
Grant 10,945,928 - Yamamoto , et al. March 16, 2 | 2021-03-16 |
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing elect
Grant 10,526,266 - Yokokawa , et al. J | 2020-01-07 |
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
Grant 10,444,627 - Takizawa , et al. Oc | 2019-10-15 |
Denture Base Coating Composition, Coating Film-bearing Denture Base, Plate Denture, And Method For Producing Coating Film-bearin
App 20190290551 - Yamamoto; Yosuke ; et al. | 2019-09-26 |
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound
Grant 10,324,374 - Yamaguchi , et al. | 2019-06-18 |
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 10,120,281 - Takahashi , et al. November 6, 2 | 2018-11-06 |
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
Grant 10,011,576 - Yamaguchi , et al. July 3, 2 | 2018-07-03 |
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,904,168 - Yokokawa , et al. February 27, 2 | 2018-02-27 |
Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask
Grant 9,798,234 - Tsuchimura , et al. October 24, 2 | 2017-10-24 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device
Grant 9,766,547 - Takizawa , et al. September 19, 2 | 2017-09-19 |
Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
Grant 9,651,863 - Takizawa , et al. May 16, 2 | 2017-05-16 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
Grant 9,551,933 - Takizawa , et al. January 24, 2 | 2017-01-24 |
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
Grant 9,527,809 - Yokokawa , et al. December 27, 2 | 2016-12-27 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,500,951 - Yokokawa , et al. November 22, 2 | 2016-11-22 |
Resin Composition, Resist Film Using Same, Resist-coated Mask Blank, Resist Pattern Forming Method, And Photo Mask
App 20160327862 - TSUCHIMURA; Tomotaka ; et al. | 2016-11-10 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20160320700 - YOKOKAWA; Natsumi ; et al. | 2016-11-03 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Photomask, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20160282720 - TAKAHASHI; Koutarou ; et al. | 2016-09-29 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device, And Compound
App 20160280675 - YAMAGUCHI; Shuhei ; et al. | 2016-09-29 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Mask Blank Provided With Actinic Ray-sensitive Or Radiation-sensitive Film, Photomask, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device, Compound, A
App 20160280621 - YOKOKAWA; Natsumi ; et al. | 2016-09-29 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
Grant 9,423,690 - Takizawa , et al. August 23, 2 | 2016-08-23 |
Active Light Sensitive Or Radiation Sensitive Resin Composition, Active Light Sensitive Or Radiation Sensitive Film, Mask Blank Provided With Active Light Sensitive Or Radiation Sensitive Film, Pattern Forming Method, Method For Manufacturing Electronic Device, Electronic Device And Novel Compound
App 20160209746 - YAMAGUCHI; Shuhei ; et al. | 2016-07-21 |
Pattern Formation Method, Active Light-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Production Method For Electronic Device Using Same, And Electronic Device
App 20160147154 - TAKIZAWA; Hiroo ; et al. | 2016-05-26 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
Grant 9,291,898 - Yokokawa , et al. March 22, 2 | 2016-03-22 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
Grant 9,291,896 - Hirano , et al. March 22, 2 | 2016-03-22 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
Grant 9,291,897 - Hirano , et al. March 22, 2 | 2016-03-22 |
Pattern Forming Method, Active Light Sensitive Or Radiation Sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device, And Electronic Device
App 20160041465 - TAKIZAWA; Hiroo ; et al. | 2016-02-11 |
Compound, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, And Pattern Formation Method, And Method For Manufacturing Electronic Device Using Same, And Electronic Device
App 20160024005 - YOKOKAWA; NATSUMI ; et al. | 2016-01-28 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Method Of Manufacturing Electronic Device Using The Same, And Electronic Device
App 20160011517 - TAKIZAWA; HIROO ; et al. | 2016-01-14 |
Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
Grant 9,223,215 - Yokokawa , et al. December 29, 2 | 2015-12-29 |
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 9,188,865 - Yokokawa , et al. November 17, 2 | 2015-11-17 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150293446 - YOKOKAWA; Natsumi ; et al. | 2015-10-15 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150284492 - YOKOKAWA; Natsumi ; et al. | 2015-10-08 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150185610 - HIRANO; Shuji ; et al. | 2015-07-02 |
Pattern Forming Method, Electron Beam-sensitive Or Extreme Ultraviolet Ray-sensitive Resin Composition, Resist Film, And Method For Manufacturing Electronic Device, And Electronic Device Using The Same
App 20150168834 - TAKIZAWA; Hiroo ; et al. | 2015-06-18 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device Using The Same, And Electronic Device
App 20150147688 - YOKOKAWA; Natsumi ; et al. | 2015-05-28 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, And Electronic Device
App 20150140484 - TAKIZAWA; Hiroo ; et al. | 2015-05-21 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, And Electronic Device
App 20150132687 - HIRANO; Shuji ; et al. | 2015-05-14 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, Electronic Device And Resin
App 20150132688 - YOKOKAWA; Natsumi ; et al. | 2015-05-14 |
Actinic-ray- Or Radiation-sensitive Resin Composition, Actinic-ray- Or Radiation-sensitive Film Therefrom, Method Of Forming Pattern, Process For Manufacturing Semiconductor Device, And Semiconductor Device
App 20150118628 - KAWABATA; Takeshi ; et al. | 2015-04-30 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film And Pattern Forming Method Using The Same, Manufacturing Method Of Semiconductor Device, And Semiconductor Device
App 20150086912 - KAWABATA; Takeshi ; et al. | 2015-03-26 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Resist Film Using The Same, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20150010857 - YOKOKAWA; Natsumi ; et al. | 2015-01-08 |
Actinic Ray-sensitive Or Radiation-sensitive Composition, Actinic Ray-sensitive Or Radiation-sensitive Film Using The Same, Pattern Forming Method, Manufacturing Method Of Electronic Device, Electronic Device And Resin
App 20140272692 - YOKOKAWA; Natsumi ; et al. | 2014-09-18 |
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