Yokoi; Shigeru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yokoi; Shigeru.The latest application filed is for "method for modifying substrate surface, modifying film and coating solution used for modification of substrate surface".

Company Profile

0.25.53

Yokoi; Shigeru - Kawasaki JP
Yokoi; Shigeru - Kawasaki-shi JP
Yokoi; Shigeru - Chiyoda-ku N/A JP
Yokoi; Shigeru - Kanagawa-ken JP
Yokoi; Shigeru - Tokyo JP
Yokoi; Shigeru - Kanagawa N/A JP
Yokoi, Shigeru - Koza-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Processing method and processing apparatus Grant 9,352,542 - Inao , et al. May 31, 2	2016-05-31
Method For Modifying Substrate Surface, Modifying Film And Coating Solution Used For Modification Of Substrate Surface App 20150184047 - Sugawara; Mai ; et al.	2015-07-02
Processing Method And Processing Apparatus App 20150013917 - Inao; Yoshihiro ; et al.	2015-01-15
Method of forming resist pattern and negative resist composition Grant 8,859,187 - Tanaka , et al. October 14, 2	2014-10-14
Laser machining device and bellows device Grant 8,803,026 - Yokoi August 12, 2	2014-08-12
Photoresist stripping solution and a method of stripping photoresists using the same Grant 8,697,345 - Wakiya , et al. April 15, 2	2014-04-15
Cleaning liquid used in photolithography and a method for treating substrate therewith Grant 8,685,910 - Yokoi , et al. April 1, 2	2014-04-01
Process control apparatus and laser processing apparatus Grant 8,648,279 - Takahashi , et al. February 11, 2	2014-02-11
Optical Path Structure Of Laser Processing Machine App 20130032580 - Yokoi; Shigeru ; et al.	2013-02-07
Cleaning liquid for lithography and method for forming wiring Grant 8,354,365 - Ohhashi , et al. January 15, 2	2013-01-15
Method for stripping photoresist Grant 8,354,215 - Yokoi , et al. January 15, 2	2013-01-15
Laser Machining Device And Bellows Device App 20120241423 - Yokoi; Shigeru	2012-09-27
Machining head, nozzle changer and laser beam machining apparatus Grant 8,212,176 - Akiyama , et al. July 3, 2	2012-07-03
Photoresist stripping solution and a method of stripping photoresists using the same Grant 8,192,923 - Yokoi , et al. June 5, 2	2012-06-05
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith Grant 8,158,568 - Yokoi , et al. April 17, 2	2012-04-17
Laser beam machine Grant D654,518 - Miyake , et al. February 21, 2	2012-02-21
Photoresist stripping solution Grant 8,114,825 - Yokoi , et al. February 14, 2	2012-02-14
Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film Grant 8,097,397 - Takayama , et al. January 17, 2	2012-01-17
Cleaning Liquid For Lithography And Method For Forming Wiring App 20110195573 - Ohhashi; Takuya ; et al.	2011-08-11
Process Control Apparatus And Laser Processing Apparatus App 20110042360 - Takahashi; Keiji ; et al.	2011-02-24
Method For Stripping Photoresist App 20110000874 - Yokoi; Shigeru ; et al.	2011-01-06
Cleaning Liquid Used In Photolithography And A Method For Treating Substrate Therewith App 20100304312 - Yokoi; Shigeru ; et al.	2010-12-02
Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith App 20100248477 - Yokoi; Shigeru ; et al.	2010-09-30
Photoresist stripping solution and a method of stripping photoresists using the same App 20100190112 - Wakiya; Kazumasa ; et al.	2010-07-29
Photoresist stripping solution and a method of stripping photoresists using the same App 20100112495 - Yokoi; Shigeru ; et al.	2010-05-06
Material For Formation Of Protective Film, Method For Formation Of Photoresist Pattern, And Solution For Washing/removal Of Protective Film App 20100086879 - Takayama; Toshikazu ; et al.	2010-04-08
Treating liquid for photoresist removal and method for treating substrate App 20100056411 - Haraguchi; Takayuki ; et al.	2010-03-04
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith App 20100051582 - Yokoi; Shigeru ; et al.	2010-03-04
Photoresist stripping solution App 20100022426 - Yokoi; Shigeru ; et al.	2010-01-28
Method for stripping photoresist App 20090291565 - Yokoi; Shigeru ; et al.	2009-11-26
Method Of Forming Resist Pattern And Negative Resist Composition App 20090191478 - Tanaka; Ken ; et al.	2009-07-30
Treating liquid for photoresist removal, and method for treating substrate App 20090176677 - Haraguchi; Takayuki ; et al.	2009-07-09
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith App 20090156005 - Yokoi; Shigeru ; et al.	2009-06-18
Method for stripping photoresist App 20080280452 - Yokoi; Shigeru ; et al.	2008-11-13
Cleaning composition and method of cleaning semiconductor substrate Grant 7,442,675 - Yokoi , et al. October 28, 2	2008-10-28
Treating liquid for photoresist removal, and method for treating substrate App 20080242575 - Haraguchi; Takayuki ; et al.	2008-10-02
Photoresist stripping solution and a method of stripping photoresists using the same App 20080241758 - Yokoi; Shigeru ; et al.	2008-10-02
Machining head, nozzle changer and laser beam machining apparatus App 20080099452 - Akiyama; Takashi ; et al.	2008-05-01
Photoresist stripping solution and a method of stripping photoresists using the same App 20080011714 - Yokoi; Shigeru ; et al.	2008-01-17
Method for stripping photoresist App 20070298619 - Yokoi; Shigeru ; et al.	2007-12-27
Photoresist stripping solution and a method of stripping photoresists using the same App 20070243494 - Yokoi; Shigeru ; et al.	2007-10-18
Photoresist stripping solution and method of treating substrate with the same App 20070105035 - Yokoi; Shigeru ; et al.	2007-05-10
Photoresist stripping solution App 20070078072 - Yokoi; Shigeru ; et al.	2007-04-05
Photoresist stripping solution and a method of stripping photoresists using the same App 20070037087 - Yokoi; Shigeru ; et al.	2007-02-15
Cleaning liquid used in photolithography and a method for treating substrate therewith App 20070027052 - Yokoi; Shigeru ; et al.	2007-02-01
Photoresist stripping solution and a method of stripping photoresists using the same App 20070003859 - Yokoi; Shigeru ; et al.	2007-01-04
Photoresist stripping solution and a method of stripping photoresists using the same App 20070004933 - Wakiya; Kazumasa ; et al.	2007-01-04
Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern Grant 7,129,020 - Wakiya , et al. October 31, 2	2006-10-31
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith App 20060241012 - Yokoi; Shigeru ; et al.	2006-10-26
Treating liquid for photoresist removal, and method for treating substrate App 20060110690 - Haraguchi; Takayuki ; et al.	2006-05-25
Photoresist stripping solution and method of treating substrate with the same App 20060063688 - Yokoi; Shigeru ; et al.	2006-03-23
Photoresist stripping solution and a method of stripping photoresists using the same App 20060035176 - Yokoi; Shigeru ; et al.	2006-02-16
Photoresist stripping solution and a method of stripping photoresists using the same App 20060014110 - Wakiya; Kazumasa ; et al.	2006-01-19
Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring App 20050187118 - Haraguchi, Takayuki ; et al.	2005-08-25
Method for removing photoresist App 20050176259 - Yokoi, Shigeru ; et al.	2005-08-11
Photoresist stripping solution and a method of stripping photoresists using the same App 20050106492 - Yokoi, Shigeru ; et al.	2005-05-19
Laser beam machining apparatus Grant 6,894,248 - Arakawa , et al. May 17, 2	2005-05-17
Photoresist stripping solution and a method of stripping photoresists using the same App 20050084792 - Yokoi, Shigeru ; et al.	2005-04-21
Laser Beam Machining Apparatus App 20050061778 - Arakawa, Yoshifumi ; et al.	2005-03-24
Photoresist stripping solution and a method of stripping photoresists using the same App 20050019688 - Wakiya, Kazumasa ; et al.	2005-01-27
Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate App 20040259761 - Yokoi, Shigeru ; et al.	2004-12-23
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith App 20040121937 - Yokoi, Shigeru ; et al.	2004-06-24
Method for processing coating film and method for manufacturing semiconductor element with use of the same method Grant 6,746,963 - Fujii , et al. June 8, 2	2004-06-08
Cleaning liquid used in photolithography and a method for treating substrate therewith App 20040106532 - Yokoi, Shigeru ; et al.	2004-06-03
Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern App 20030219682 - Wakiya, Kazumasa ; et al.	2003-11-27
Photoresist stripping solution and a method of stripping photoresists using the same App 20030138737 - Wakiya, Kazumasa ; et al.	2003-07-24
Photoresist stripping solution and a method of stripping photoresists using the same App 20030114014 - Yokoi, Shigeru ; et al.	2003-06-19
Photoresist stripping solution and a method of stripping photoresists using the same App 20030099908 - Yokoi, Shigeru ; et al.	2003-05-29
Method for processing coating film and method for manufacturing semiconductor element with use of the same method App 20020164886 - Fujii, Yasushi ; et al.	2002-11-07
Composition for lithographic anti-reflection coating, and resist laminate using the same App 20010026903 - Wakiya, Kazumasa ; et al.	2001-10-04

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