YIN; Yunpeng

Patent Applications and Registrations

Patent applications and USPTO patent grants for YIN; Yunpeng.The latest application filed is for "charging control circuit, charging circuit and charging control method".

Company Profile

3.97.98

YIN; Yunpeng - Dongguan CN
Yin; Yunpeng - Schenectady NY
Yin; Yunpeng - Niskayuna NY
Yin; Yunpeng - Armonk NY
Yin; Yunpeng - Albany NY US
Yin; Yunpeng - Guilderland NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Charging Control Circuit, Charging Circuit And Charging Control Method App 20210249887 - YIN; Yunpeng	2021-08-12
Self-aligned contact process enabled by low temperature Grant 10,566,454 - He , et al. Feb	2020-02-18
FinFET with merge-free fins Grant 10,529,858 - He , et al. J	2020-01-07
Stoplayer App 20190206864 - He; Hong ; et al.	2019-07-04
Fin formation in fin field effect transistors Grant 10,340,368 - Cheng , et al.	2019-07-02
Fin Formation In Fin Field Effect Transistors App 20190019883 - Cheng; Kangguo ; et al.	2019-01-17
Fin density control of multigate devices through sidewall image transfer processes Grant 10,170,327 - He , et al. J	2019-01-01
Critical dimension shrink through selective metal growth on metal hardmask sidewalls Grant 10,168,075 - Chen , et al. J	2019-01-01
Bulk fin formation with vertical fin sidewall profile Grant 10,170,471 - Cheng , et al. J	2019-01-01
Work function metal fill for replacement gate fin field effect transistor process Grant 10,164,060 - He , et al. Dec	2018-12-25
Work function metal fill for replacement gate fin field effect transistor process Grant 10,147,803 - He , et al. De	2018-12-04
Fin formation in fin field effect transistors Grant 10,141,428 - Cheng , et al. Nov	2018-11-27
Self-aligned Contact Process Enabled By Low Temperature App 20180331039 - HE; Hong ; et al.	2018-11-15
Critical Dimension Shrink Through Selective Metal Growth On Metal Hardmask Sidewalls App 20180223522 - Chen; Hsueh-Chung H. ; et al.	2018-08-09
Self-aligned contact process enabled by low temperature Grant 10,037,944 - He , et al. July 31, 2	2018-07-31
Finfet With Merge-free Fins App 20180197980 - He; Hong ; et al.	2018-07-12
Methods for forming FinFETs having epitaxial Si S/D extensions with flat top surfaces on a SiGe seed layer Grant 10,020,303 - He , et al. July 10, 2	2018-07-10
Non-lithographic line pattern formation Grant 9,997,367 - Tseng , et al. June 12, 2	2018-06-12
FinFETs with non-merged epitaxial S/D extensions having a SiGe seed layer on insulator Grant 9,991,258 - He , et al. June 5, 2	2018-06-05
FinFETs with non-merged epitaxial S/D extensions on a seed layer and having flat top surfaces Grant 9,991,255 - He , et al. June 5, 2	2018-06-05
FinFET semiconductor device having integrated SiGe fin Grant 9,985,030 - Cheng , et al. May 29, 2	2018-05-29
Critical dimension shrink through selective metal growth on metal hardmask sidewalls Grant 9,953,916 - Chen , et al. April 24, 2	2018-04-24
Fin Density Control Of Multigate Devices Through Sidewall Image Transfer Processes App 20170271167 - He; Hong ; et al.	2017-09-21
Method and structure of forming FinFET electrical fuse structure Grant 9,768,276 - He , et al. September 19, 2	2017-09-19
Fin density control of multigate devices through sidewall image transfer processes Grant 9,728,419 - He , et al. August 8, 2	2017-08-08
Densely spaced fins for semiconductor fin field effect transistors Grant 9,728,534 - He , et al. August 8, 2	2017-08-08
Fin formation in fin field effect transistors Grant 9,728,625 - Cheng , et al. August 8, 2	2017-08-08
Critical dimension shrink through selective metal growth on metal hardmask sidewalls Grant 9,716,038 - Chen , et al. July 25, 2	2017-07-25
Fin Formation In Fin Field Effect Transistors App 20170194463 - Cheng; Kangguo ; et al.	2017-07-06
Low Temperature Selective Deposition Employing A Germanium-containing Gas Assisted Etch App 20170194138 - Brabant; Paul D. ; et al.	2017-07-06
STRUCTURE AND METHOD FOR SiGe FIN FORMATION IN A SEMICONDUCTOR DEVICE App 20170186747 - Doris; Bruce B. ; et al.	2017-06-29
Stop Layer Through Ion Implantation For Etch Stop App 20170148790 - HE; Hong ; et al.	2017-05-25
Critical Dimension Shrink Through Selective Metal Growth On Metal Hardmask Sidewalls App 20170148730 - Chen; Hsueh-Chung H. ; et al.	2017-05-25
Self-aligned Contact Process Enabled By Low Temperature App 20170141038 - HE; Hong ; et al.	2017-05-18
Method and structure of forming FinFET electrical fuse structure Grant 9,647,092 - He , et al. May 9, 2	2017-05-09
Self-aligned contact process enabled by low temperature Grant 9,634,117 - He , et al. April 25, 2	2017-04-25
Partially isolated fin-shaped field effect transistors Grant 9,634,000 - He , et al. April 25, 2	2017-04-25
Stop layer through ion implantation for etch stop Grant 9,627,263 - He , et al. April 18, 2	2017-04-18
Critical dimension shrink through selective metal growth on metal hardmask sidewalls Grant 9,595,473 - Chen , et al. March 14, 2	2017-03-14
Gate structure integration scheme for fin field effect transistors Grant 9,583,585 - He , et al. February 28, 2	2017-02-28
Low-k Spacer For Rmg Finfet Formation App 20170040437 - He; Hong ; et al.	2017-02-09
Non-merged Epitaxially Grown Mosfet Devices App 20170033104 - HE; HONG ; et al.	2017-02-02
Bulk Fin Formation With Vertical Fin Sidewall Profile App 20170033103 - Cheng; Kangguo ; et al.	2017-02-02
Ultra-thin metal wires formed through selective deposition Grant 9,558,999 - Li , et al. January 31, 2	2017-01-31
Low-K spacer for RMG finFET formation Grant 9,543,407 - He , et al. January 10, 2	2017-01-10
Bulk fin formation with vertical fin sidewall profile Grant 9,515,089 - Cheng , et al. December 6, 2	2016-12-06
Critical Dimension Shrink Through Selective Metal Growth On Metal Hardmask Sidewalls App 20160351447 - Chen; Hsueh-Chung H. ; et al.	2016-12-01
Critical Dimension Shrink Through Selective Metal Growth On Metal Hardmask Sidewalls App 20160351448 - Chen; Hsueh-Chung H. ; et al.	2016-12-01
Densely spaced fins for semiconductor fin field effect transistors Grant 9,508,713 - He , et al. November 29, 2	2016-11-29
Bulk Fin Formation With Vertical Fin Sidewall Profile App 20160336347 - Cheng; Kangguo ; et al.	2016-11-17
Work Function Metal Fill For Replacement Gate Fin Field Effect Transistor Process App 20160329415 - He; Hong ; et al.	2016-11-10
Non-lithographic Line Pattern Formation App 20160329214 - Tseng; Chiahsun ; et al.	2016-11-10
Methods for forming FinFETs with non-merged epitaxial fin extensions Grant 9,484,440 - He , et al. November 1, 2	2016-11-01
Method And Structure Of Forming Finfet Electrical Fuse Structure App 20160315175 - He; Hong ; et al.	2016-10-27
Method And Structure Of Forming Finfet Electrical Fuse Structure App 20160315049 - He; Hong ; et al.	2016-10-27
Work Function Metal Fill For Replacement Gate Fin Field Effect Transistor Process App 20160300721 - He; Hong ; et al.	2016-10-13
Work function metal fill for replacement gate fin field effect transistor process Grant 9,406,746 - He , et al. August 2, 2	2016-08-02
Non-lithographic line pattern formation Grant 9,396,957 - Tseng , et al. July 19, 2	2016-07-19
Self-aligned Contact Process Enabled By Low Temperature App 20160204257 - HE; Hong ; et al.	2016-07-14
Gate structure integration scheme for fin field effect transistors Grant 9,391,155 - He , et al. July 12, 2	2016-07-12
Fin formation in fin field effect transistors Grant 9,379,218 - Cheng , et al. June 28, 2	2016-06-28
Dual hard mask lithography process Grant 9,373,580 - Arnold , et al. June 21, 2	2016-06-21
Non-lithographic hole pattern formation Grant 9,330,962 - Tseng , et al. May 3, 2	2016-05-03
Double self aligned via patterning Grant 9,330,965 - Chen , et al. May 3, 2	2016-05-03
Gate Structure Integration Scheme For Fin Field Effect Transistors App 20160118302 - He; Hong ; et al.	2016-04-28
Self-aligned contact process enabled by low temperature Grant 9,324,830 - He , et al. April 26, 2	2016-04-26
Fin Formation In Fin Field Effect Transistors App 20160111525 - Cheng; Kangguo ; et al.	2016-04-21
Sidewall image transfer with a spin-on hardmask Grant 9,293,345 - He , et al. March 22, 2	2016-03-22
Gate Structure Integration Scheme For Fin Field Effect Transistors App 20160079384 - He; Hong ; et al.	2016-03-17
Double self-aligned via patterning Grant 9,257,334 - Chen , et al. February 9, 2	2016-02-09
Gate structure integration scheme for fin field effect transistors Grant 9,252,243 - He , et al. February 2, 2	2016-02-02
Patterning assist feature to mitigate reactive ion etch microloading effect Grant 9,252,022 - Dechene , et al. February 2, 2	2016-02-02
Densely Spaced Fins For Semiconductor Fin Field Effect Transistors App 20160027776 - He; Hong ; et al.	2016-01-28
Double Self Aligned Via Patterning App 20150371896 - Chen; Hsueh-Chung ; et al.	2015-12-24
Double self aligned via patterning Grant 9,219,007 - Chen , et al. December 22, 2	2015-12-22
Double Self-aligned Via Patterning App 20150364372 - Chen; Hsueh-Chung ; et al.	2015-12-17
finFET isolation by selective cyclic etch Grant 9,209,178 - Kanakasabapathy , et al. December 8, 2	2015-12-08
ELECTRICALLY ISOLATED SiGe FIN FORMATION BY LOCAL OXIDATION App 20150332977 - Cheng; Kangguo ; et al.	2015-11-19
Fin Formation In Fin Field Effect Transistors App 20150311320 - Cheng; Kangguo ; et al.	2015-10-29
Non-merged Epitaxially Grown Mosfet Devices App 20150295065 - HE; HONG ; et al.	2015-10-15
FINFET SEMICONDUCTOR DEVICE HAVING INTEGRATED SiGe FIN App 20150287614 - Cheng; Kangguo ; et al.	2015-10-08
Self-aligned Contact Process Enabled By Low Temperature App 20150279996 - HE; Hong ; et al.	2015-10-01
Densely Spaced Fins For Semiconductor Fin Field Effect Transistors App 20150255300 - He; Hong ; et al.	2015-09-10
Low-k Spacer For Rmg Finfet Formation App 20150243760 - He; Hong ; et al.	2015-08-27
Fin Density Control Of Multigate Devices Through Sidewall Image Transfer Processes App 20150243513 - He; Hong ; et al.	2015-08-27
Work Function Metal Fill For Replacement Gate Fin Field Effect Transistor Process App 20150236159 - He; Hong ; et al.	2015-08-20
Gate Structure Integration Scheme For Fin Field Effect Transistors App 20150228762 - He; Hong ; et al.	2015-08-13
Profile control in interconnect structures Grant 9,105,641 - Chen , et al. August 11, 2	2015-08-11
Hardmask Faceting For Enhancing Metal Fill In Trenches App 20150221547 - Arnold; John C. ; et al.	2015-08-06
Sidewall image transfer with a spin-on hardmask Grant 9,099,401 - He , et al. August 4, 2	2015-08-04
Electrically isolated SiGe fin formation by local oxidation Grant 9,093,326 - Cheng , et al. July 28, 2	2015-07-28
Non-merged Epitaxially Grown Mosfet Devices App 20150206877 - HE; HONG ; et al.	2015-07-23
Non-merged Epitaxially Grown Mosfet Devices App 20150194504 - HE; HONG ; et al.	2015-07-09
Self-aligned trench over fin Grant 9,076,733 - Tseng , et al. July 7, 2	2015-07-07
Fin Density Control Of Multigate Devices Through Sidewall Image Transfer Processes App 20150179769 - He; Hong ; et al.	2015-06-25
Trench patterning with block first sidewall image transfer Grant 9,064,813 - Kanakasabapathy , et al. June 23, 2	2015-06-23
Fin density control of multigate devices through sidewall image transfer processes Grant 9,064,901 - He , et al. June 23, 2	2015-06-23
Non-merged epitaxially grown MOSFET devices Grant 9,059,002 - He , et al. June 16, 2	2015-06-16
Semiconductor device including source/drain formed on bulk and gate channel formed on oxide layer Grant 9,059,019 - He , et al. June 16, 2	2015-06-16
Self-aligned vias formed using sacrificial metal caps Grant 9,059,257 - Li , et al. June 16, 2	2015-06-16
Double density semiconductor fins and method of fabrication Grant 9,054,020 - He , et al. June 9, 2	2015-06-09
Non-lithographic hole pattern formation Grant 9,054,156 - Tseng , et al. June 9, 2	2015-06-09
Partially isolated Fin-shaped field effect transistors Grant 9,053,965 - He , et al. June 9, 2	2015-06-09
finFET Isolation by Selective Cyclic Etch App 20150145065 - Kanakasabapathy; Sivananda K. ; et al.	2015-05-28
Finfet With Merge-free Fins App 20150144886 - He; Hong ; et al.	2015-05-28
Finfet formed over dielectric Grant 9,041,094 - He , et al. May 26, 2	2015-05-26
Finfet With Merge-free Fins App 20150140762 - He; Hong ; et al.	2015-05-21
Electrically Isolated SiGe FIN Formation By Local Oxidation App 20150108572 - Cheng; Kangguo ; et al.	2015-04-23
Self-aligned Vias Formed Using Sacrificial Metal Caps App 20150091181 - Li; Juntao ; et al.	2015-04-02
Lithographic material stack including a metal-compound hard mask Grant 8,986,921 - Edelstein , et al. March 24, 2	2015-03-24
Ultra-thin Metal Wires Formed Through Selective Deposition App 20150069625 - Li; Juntao ; et al.	2015-03-12
Non-merged Epitaxially Grown Mosfet Devices App 20150061015 - He; Hong ; et al.	2015-03-05
Contact structure employing a self-aligned gate cap Grant 8,969,189 - He , et al. March 3, 2	2015-03-03
Non-lithographic line pattern formation Grant 8,969,213 - Tseng , et al. March 3, 2	2015-03-03
Finfet Formed Over Dielectric App 20150054121 - He; Hong ; et al.	2015-02-26
Finfet Formed Over Dielectric App 20150054077 - He; Hong ; et al.	2015-02-26
Sidewall Image Transfer With A Spin-on Hardmask App 20150048429 - He; Hong ; et al.	2015-02-19
Sidewall Image Transfer With A Spin-on Hardmask App 20150048430 - He; Hong ; et al.	2015-02-19
Semiconductor device including source/drain formed on bulk and gate channel formed on oxide layer Grant 8,957,478 - He , et al. February 17, 2	2015-02-17
FinFET formed over dielectric Grant 8,951,850 - He , et al. February 10, 2	2015-02-10
Profile Control In Interconnect Structures App 20150035154 - Chen; Shyng-Tsong ; et al.	2015-02-05
Trench Patterning With Block First Sidewall Image Transfer App 20150031201 - Kanakasabapathy; Sivananda K. ; et al.	2015-01-29
Semiconductor Device Including Source/drain Formed On Bulk And Gate Channel Formed On Oxide Layer App 20140377917 - He; Hong ; et al.	2014-12-25
Semiconductor Device Including Source/drain Formed On Bulk And Gate Channel Formed On Oxide Layer App 20140374839 - He; Hong ; et al.	2014-12-25
Dual hard mask lithography process Grant 8,916,337 - Arnold , et al. December 23, 2	2014-12-23
Double Self Aligned Via Patterning App 20140363969 - Chen; Hsueh-Chung ; et al.	2014-12-11
Horizontal metal-insulator-metal capacitor Grant 8,901,711 - Yang , et al. December 2, 2	2014-12-02
Non-lithographic Line Pattern Formation App 20140349088 - Tseng; Chiahsun ; et al.	2014-11-27
Non-lithographic Hole Pattern Formation App 20140346640 - Tseng; Chiahsun ; et al.	2014-11-27
Sidewall image transfer process Grant 8,883,649 - Yin , et al. November 11, 2	2014-11-11
Contact structure employing a self-aligned gate cap Grant 8,872,244 - He , et al. October 28, 2	2014-10-28
Trench Patterning With Block First Sidewall Image Transfer App 20140315380 - Kanakasabapathy; Sivananda K. ; et al.	2014-10-23
Contact Structure Employing A Self-aligned Gate Cap App 20140315379 - He; Hong ; et al.	2014-10-23
Contact Structure Employing A Self-aligned Gate Cap App 20140312433 - HE; Hong ; et al.	2014-10-23
DSA grapho-epitaxy process with etch stop material Grant 8,859,433 - Abdallah , et al. October 14, 2	2014-10-14
Inductor formation with sidewall image transfer Grant 8,859,384 - Chen , et al. October 14, 2	2014-10-14
Partially Isolated Fin-shaped Field Effect Transistors App 20140264596 - He; Hong ; et al.	2014-09-18
Partially Isolated Fin-shaped Field Effect Transistors App 20140264603 - He; Hong ; et al.	2014-09-18
Method of fabricating a profile control in interconnect structures Grant 8,835,305 - Yang , et al. September 16, 2	2014-09-16
Self-aligned Trench Over Fin App 20140256139 - Tseng; Chiahsun ; et al.	2014-09-11
Dsa Grapho-epitaxy Process With Etch Stop Material App 20140256145 - ABDALLAH; JASSEM A. ; et al.	2014-09-11
Self-aligned trench over fin Grant 8,796,812 - Tseng , et al. August 5, 2	2014-08-05
Lithographic Material Stack Including A Metal-compound Hard Mask App 20140199628 - Edelstein; Daniel C. ; et al.	2014-07-17
Double Density Semiconductor Fins And Method Of Fabrication App 20140145295 - He; Hong ; et al.	2014-05-29
Method for forming small dimension openings in the organic masking layer of tri-layer lithography Grant 8,735,283 - Arnold , et al. May 27, 2	2014-05-27
Three photomask sidewall image transfer method Grant 8,716,133 - Chen , et al. May 6, 2	2014-05-06
Dual Hard Mask Lithography Process App 20140110846 - Arnold; John C. ; et al.	2014-04-24
Three Photomask Sidewall Image Transfer Method App 20140057436 - Chen; Shyng-Tsong ; et al.	2014-02-27
Profile Control In Interconnect Structures App 20140035142 - Yang; Chih-Chao ; et al.	2014-02-06
Non-lithographic Hole Pattern Formation App 20140027923 - Tseng; Chiahsun ; et al.	2014-01-30
Self-aligned Trench Over Fin App 20140027878 - Tseng; Chiahsun ; et al.	2014-01-30
Non-lithographic Line Pattern Formation App 20140027917 - Tseng; Chiahsun ; et al.	2014-01-30
Image transfer process employing a hard mask layer Grant 8,637,406 - Jung , et al. January 28, 2	2014-01-28
Image Transfer Process Employing A Hard Mask Layer App 20140023834 - Jung; Ryan O. ; et al.	2014-01-23
Image Transfer Process Employing A Hard Mask Layer App 20140024219 - Jung; Ryan O. ; et al.	2014-01-23
Method of making a semiconductor device Grant 8,586,478 - Soda , et al. November 19, 2	2013-11-19
Film stack including metal hardmask layer for sidewall image transfer fin field effect transistor formation Grant 8,586,482 - Arnold , et al. November 19, 2	2013-11-19
Film stack including metal hardmask layer for sidewall image transfer fin field effect transistor formation Grant 8,580,692 - Arnold , et al. November 12, 2	2013-11-12
Self aligning via patterning Grant 8,518,824 - Arnold , et al. August 27, 2	2013-08-27
Dual Hard Mask Lithography Process App 20130216776 - Arnold; John C. ; et al.	2013-08-22
Tone Inversion With Partial Underlayer Etch For Semiconductor Device Formation App 20130175658 - Arnold; John C. ; et al.	2013-07-11
Tone inversion with partial underlayer etch for semiconductor device formation Grant 8,470,711 - Arnold , et al. June 25, 2	2013-06-25
Film Stack Including Metal Hardmask Layer For Sidewall Image Transfer Fin Field Effect Transistor Formation App 20130001750 - ARNOLD; JOHN C. ; et al.	2013-01-03
Film Stack Including Metal Hardmask Layer For Sidewall Image Transfer Fin Field Effect Transistor Formation App 20130001749 - ARNOLD; JOHN C. ; et al.	2013-01-03
Method Of Making A Semiconductor Device App 20120329268 - SODA; Eiichi ; et al.	2012-12-27
Method For Forming Small Dimension Openings In The Organic Masking Layer Of Tri-layer Lithography App 20120329272 - Arnold; John C. ; et al.	2012-12-27
Self Aligning Via Patterning App 20120302057 - Arnold; John Christopher ; et al.	2012-11-29
Sidewall Image Transfer Process Employing A Cap Material Layer For A Metal Nitride Layer App 20120282779 - Arnold; John C. ; et al.	2012-11-08
Sidewall image transfer process employing a cap material layer for a metal nitride layer Grant 8,298,954 - Arnold , et al. October 30, 2	2012-10-30
Self aligning via patterning Grant 8,298,943 - Arnold , et al. October 30, 2	2012-10-30
Sidewall Image Transfer Process App 20120244711 - Yin; Yunpeng ; et al.	2012-09-27
Tone Inversion With Partial Underlayer Etch App 20120126358 - Arnold; John C. ; et al.	2012-05-24
Mask and etch process for pattern assembly Grant 8,119,531 - Arnold , et al. February 21, 2	2012-02-21