Yin; Gerald Z.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yin; Gerald Z..The latest application filed is for "magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma".

Company Profile

0.18.1

Yin; Gerald Z. - Cupertino CA
Yin; Gerald Z. - San Jose CA
Yin; Gerald Z - Cupertino CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Highly selective oxide etch process using hexafluorobutadiene Grant 6,613,691 - Hung , et al. September 2, 2	2003-09-02
Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window Grant 6,602,434 - Hung , et al. August 5, 2	2003-08-05
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma Grant 6,402,885 - Loewenhardt , et al. June 11, 2	2002-06-11
Inductively coupled parallel-plate plasma reactor with a conical dome Grant 6,308,654 - Schneider , et al. October 30, 2	2001-10-30
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma App 20010004920 - Loewenhardt, Peter K. ; et al.	2001-06-28
Tunable process for selectively etching oxide using fluoropropylene and a hydrofluorocarbon Grant 6,183,655 - Wang , et al. February 6, 2	2001-02-06
Method manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxide Grant 6,074,959 - Wang , et al. June 13, 2	2000-06-13
Silicon carbide composite article particularly useful for plasma reactors Grant 5,904,778 - Lu , et al. May 18, 1	1999-05-18
Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material Grant 5,753,137 - Ye , et al. May 19, 1	1998-05-19
Dry cleaning of semiconductor processing chambers Grant 5,685,916 - Ye , et al. November 11, 1	1997-11-11
Plasma dry cleaning of semiconductor processing chambers Grant 5,676,759 - Ye , et al. October 14, 1	1997-10-14
Inductively enhanced reactive ion etching Grant 5,607,542 - Wu , et al. March 4, 1	1997-03-04
Arc suppression in a plasma processing system Grant 5,573,596 - Yin November 12, 1	1996-11-12
Ion energy analyzer with an electrically controlled geometric filter Grant 5,565,681 - Loewenhardt , et al. October 15, 1	1996-10-15
Silicon scavenger in an inductively coupled RF plasma reactor Grant 5,556,501 - Collins , et al. September 17, 1	1996-09-17
Plasma reactor with multi-section RF coil and isolated conducting lid Grant 5,540,824 - Yin , et al. July 30, 1	1996-07-30
Composite diagnostic wafer for semiconductor wafer processing systems Grant 5,451,784 - Loewenhardt , et al. September 19, 1	1995-09-19
Method and system for clamping semiconductor wafers Grant 5,262,029 - Erskine , et al. November 16, 1	1993-11-16
Split-phase driver for plasma etch system Grant 4,871,421 - Ogle , et al. October 3, 1	1989-10-03

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