loadpatents
Patent applications and USPTO patent grants for Yen; Ying-Wei.The latest application filed is for "semiconductor device and method for fabricating the same".
Patent | Date |
---|---|
Semiconductor Device And Method For Fabricating The Same App 20210296466 - Kuo; Chia-Ming ;   et al. | 2021-09-23 |
Semiconductor device and method for fabricating the same Grant 11,063,135 - Kuo , et al. July 13, 2 | 2021-07-13 |
Semiconductor Device And Method For Fabricating The Same App 20190348520 - Kuo; Chia-Ming ;   et al. | 2019-11-14 |
Semiconductor Structure App 20170186617 - Lin; Chien-Liang ;   et al. | 2017-06-29 |
Semiconductor structure and process thereof Grant 9,634,083 - Lin , et al. April 25, 2 | 2017-04-25 |
Polysilicon Layer App 20150021776 - Lin; Chien-Liang ;   et al. | 2015-01-22 |
Method for processing high-k dielectric layer Grant 8,921,238 - Wang , et al. December 30, 2 | 2014-12-30 |
Polysilicon layer and method of forming the same Grant 8,895,435 - Lin , et al. November 25, 2 | 2014-11-25 |
Semiconductor process Grant 8,889,523 - Sun , et al. November 18, 2 | 2014-11-18 |
Semiconductor structure and fabrication method thereof Grant 8,802,579 - Lin , et al. August 12, 2 | 2014-08-12 |
Semiconductor Structure And Process Thereof App 20140159211 - Lin; Chien-Liang ;   et al. | 2014-06-12 |
Process for fabricating semiconductor device and method of fabricating metal oxide semiconductor device Grant 8,741,784 - Lin , et al. June 3, 2 | 2014-06-03 |
Gate structure and a method for forming the same Grant 8,614,152 - Lin , et al. December 24, 2 | 2013-12-24 |
Manufacturing method for metal gate using ion implantation Grant 8,536,038 - Wang , et al. September 17, 2 | 2013-09-17 |
Method for fabricating silicon dioxide layer Grant 8,501,636 - Wang , et al. August 6, 2 | 2013-08-06 |
Semiconductor Process App 20130171837 - Sun; Te-Lin ;   et al. | 2013-07-04 |
Semiconductor process Grant 8,426,277 - Lin , et al. April 23, 2 | 2013-04-23 |
Semiconductor Structure And Fabrication Method Thereof App 20130093064 - Lin; Chien-Liang ;   et al. | 2013-04-18 |
Semiconductor Process App 20130078818 - Lin; Chien-Liang ;   et al. | 2013-03-28 |
Method For Processing High-k Dielectric Layer App 20130072030 - Wang; Shao-Wei ;   et al. | 2013-03-21 |
Process For Fabricating Semiconductor Device And Method Of Fabricating Metal Oxide Semiconductor Device App 20130072028 - LIN; CHIEN-LIANG ;   et al. | 2013-03-21 |
Process for forming repair layer and MOS transistor having repair layer Grant 8,394,688 - Lin , et al. March 12, 2 | 2013-03-12 |
Semiconductor Process App 20130012012 - Lin; Chien-Liang ;   et al. | 2013-01-10 |
Fabricating Method Of Mos Transistor, Fin Field-effect Transistor And Fabrication Method Thereof App 20130001707 - Lin; Chien-Liang ;   et al. | 2013-01-03 |
Process For Forming Repair Layer And Mos Transistor Having Repair Layer App 20120326162 - LIN; Chien-Liang ;   et al. | 2012-12-27 |
Gate Dielectric Layer Forming Method App 20120329285 - WANG; Shao-Wei ;   et al. | 2012-12-27 |
Manufacturing Method For Metal Gate App 20120329261 - Wang; Shao-Wei ;   et al. | 2012-12-27 |
Semiconductor Process And Structure Thereof App 20120306028 - Wang; Yu-Ren ;   et al. | 2012-12-06 |
Method For Fabricating Semiconductor Device App 20120309171 - Lu; Tsuo-Wen ;   et al. | 2012-12-06 |
Gate Structure And A Method For Forming The Same App 20120299124 - LIN; Chien-Liang ;   et al. | 2012-11-29 |
Manufacturing Method For Metal Gate Structure App 20120264284 - Wang; Shao-Wei ;   et al. | 2012-10-18 |
Silicon dioxide film fabricating process Grant 8,263,501 - Lin , et al. September 11, 2 | 2012-09-11 |
Polysilicon Layer And Method Of Forming The Same App 20120193796 - Lin; Chien-Liang ;   et al. | 2012-08-02 |
Method for gate leakage reduction and Vt shift control and complementary metal-oxide-semiconductor device Grant 8,232,605 - Lin , et al. July 31, 2 | 2012-07-31 |
Silicon Dioxide Film Fabricating Process App 20120156891 - LIN; Chien-Liang ;   et al. | 2012-06-21 |
Multi-step annealing process Grant 7,811,892 - Wang , et al. October 12, 2 | 2010-10-12 |
Method for gate leakage reduction and Vt shift control and complementary metal-oxide-semiconductor device App 20100148271 - Lin; Chien-Liang ;   et al. | 2010-06-17 |
Method of fabricating gate structure Grant 7,709,316 - Wang , et al. May 4, 2 | 2010-05-04 |
Method for switching decoupled plasma nitridation processes of different doses Grant 7,601,404 - Yen , et al. October 13, 2 | 2009-10-13 |
Method Of Fabricating Gate Structure App 20080318405 - Wang; Yun-Ren ;   et al. | 2008-12-25 |
Method Of Fabricating Gate Dielectric Layer App 20080254642 - Wang; Yun-Ren ;   et al. | 2008-10-16 |
Method of fabricating gate structure Grant 7,435,640 - Wang , et al. October 14, 2 | 2008-10-14 |
Gate Structure App 20080157231 - Wang; Yun-Ren ;   et al. | 2008-07-03 |
Method of manufacturing metal-oxide-semiconductor transistor Grant 7,335,548 - Wang , et al. February 26, 2 | 2008-02-26 |
Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device Grant 7,312,139 - Wang , et al. December 25, 2 | 2007-12-25 |
Method for fabricating dielectric layer doped with nitrogen Grant 7,265,065 - Wang , et al. September 4, 2 | 2007-09-04 |
Gate Structure And Method Of Fabricating The Same App 20070102774 - Wang; Yun-Ren ;   et al. | 2007-05-10 |
Method of forming gate dielectric layer Grant 7,214,631 - Wang , et al. May 8, 2 | 2007-05-08 |
Multi-step Annealing Process App 20070082506 - Wang; Yun-Ren ;   et al. | 2007-04-12 |
Method Of Fabricating A Dielectric Layer App 20070082503 - Wang; Yun-Ren ;   et al. | 2007-04-12 |
Method for Switching Decoupled Plasma Nitridation Processes of Different Doses App 20060280876 - Yen; Ying-Wei ;   et al. | 2006-12-14 |
Method for Fabricating Dielectric Layer Doped with Nitrogen App 20060246739 - Wang; Yun-Ren ;   et al. | 2006-11-02 |
Method of manufacturing metal-oxide-semiconductor transistor App 20060189065 - Wang; Yun-Ren ;   et al. | 2006-08-24 |
Method Of Forming Gate Dielectric Layer App 20060172554 - Wang; Yu-Ren ;   et al. | 2006-08-03 |
Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device App 20060148179 - Wang; Yu-Ren ;   et al. | 2006-07-06 |
Process For Depositing Btbas-based Silicon Nitride Films App 20060062913 - Wang; Yun-Ren ;   et al. | 2006-03-23 |
Method For Fabricating A Semiconductor Transistor Device Having Ultra-shallow Source/drain Extensions App 20060014350 - Wang; Yun-Ren ;   et al. | 2006-01-19 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.