YEH; Wendy H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for YEH; Wendy H..The latest application filed is for "compensating concentration uncertainity".

Company Profile

0.13.25

YEH; Wendy H. - Mountain View CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Compensating Concentration Uncertainity App 20130284090 - BALASUBRAMANIAN; Ganesh ; et al.	2013-10-31
Graded ARC for high NA and immersion lithography Grant 8,125,034 - Yeh , et al. February 28, 2	2012-02-28
Graded Arc For High Na And Immersion Lithography App 20100239979 - Yeh; Wendy H. ; et al.	2010-09-23
Graded ARC for high NA and immersion lithography Grant 7,776,516 - Yeh , et al. August 17, 2	2010-08-17
Method of reducing critical dimension bias during fabrication of a semiconductor device Grant 7,737,040 - Bencher , et al. June 15, 2	2010-06-15
Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes Grant 7,718,081 - Liu , et al. May 18, 2	2010-05-18
Hydrogen treatment to improve photoresist adhesion and rework consistency Grant 7,642,195 - Yeh January 5, 2	2010-01-05
Methods For High Temperature Deposition Of An Amorphous Carbon Layer App 20090093128 - SEAMONS; MARTIN JAY ; et al.	2009-04-09
Methods Of Trimming Amorphous Carbon Film For Forming Ultra Thin Structures On A Substrate App 20090004875 - Shen; Meihua ; et al.	2009-01-01
Plasma-induced Charge Damage Control For Plasma Enhanced Chemical Vapor Deposition Processes App 20080254233 - LEE; KWANGDUK DOUGLAS ; et al.	2008-10-16
Absorber Layer For Dsa Processing App 20080230154 - Autryve; Luc Van ; et al.	2008-09-25
Liquid precursors for the CVD deposition of amorphous carbon films Grant 7,407,893 - Seamons , et al. August 5, 2	2008-08-05
Reticle fabrication using a removable hard mask Grant 7,365,014 - Bencher , et al. April 29, 2	2008-04-29
Method of reducing critical dimension bias during fabrication of a semiconductor device App 20080096138 - Bencher; Christopher Dennis ; et al.	2008-04-24
Graded ARC for high na and immersion lithography App 20080020319 - Yeh; Wendy H. ; et al.	2008-01-24
Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20070286965 - Seamons; Martin Jay ; et al.	2007-12-13
Absorber Layer For Dsa Processing App 20070243721 - AUTRYVE; LUC VAN ; et al.	2007-10-18
Enhancement of remote plasma source clean for dielectric films App 20070207275 - Nowak; Thomas ; et al.	2007-09-06
Absorber layer for DSA processing Grant 7,262,106 - Autryve , et al. August 28, 2	2007-08-28
Hydrogen treatment to improve photoresist adhesion and rework consistency App 20070072422 - Yeh; Wendy H.	2007-03-29
Absorber Layer For Dsa Processing App 20060292808 - Autryve; Luc Van ; et al.	2006-12-28
Techniques For The Use Of Amorphous Carbon (apf) For Various Etch And Litho Integration Schemes App 20060231524 - Liu; Wei ; et al.	2006-10-19
Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20060222771 - Seamons; Martin Jay ; et al.	2006-10-05
Absorber layer for DSA processing Grant 7,109,087 - Autryve , et al. September 19, 2	2006-09-19
Ashable layers for reducing critical dimensions of integrated circuit features Grant 7,105,442 - Shan , et al. September 12, 2	2006-09-12
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon Grant 7,094,442 - Seamons , et al. August 22, 2	2006-08-22
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme Grant 7,064,078 - Liu , et al. June 20, 2	2006-06-20
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon App 20060014397 - Seamons; Martin Jay ; et al.	2006-01-19
Liquid precursors for the CVD deposition of amorphous carbon films App 20050287771 - Seamons, Martin Jay ; et al.	2005-12-29
Reticle fabrication using a removable hard mask App 20050170655 - Bencher, Christopher Dennis ; et al.	2005-08-04
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme App 20050167394 - liu, Wei ; et al.	2005-08-04
Process kit design for deposition chamber App 20050150452 - Sen, Soovo ; et al.	2005-07-14
Absorber layer for DSA processing App 20050074956 - Autryve, Luc Van ; et al.	2005-04-07
Absorber layer for DSA processing App 20050074986 - Autryve, Luc Van ; et al.	2005-04-07
Nitrogen-free antireflective coating for use with photolithographic patterning Grant 6,853,043 - Yeh , et al. February 8, 2	2005-02-08
Nitrogen-free antireflective coating for use with photolithographic patterning App 20040087139 - Yeh, Wendy H. ; et al.	2004-05-06
Ashable layers for reducing critical dimensions of integrated circuit features App 20030219988 - Shan, Hongqing ; et al.	2003-11-27

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