Yeh; Lee-Chih
Patent Applications and Registrations
Patent applications and USPTO patent grants for Yeh; Lee-Chih.The latest application filed is for "wet suit and composite cloth thereof".
- Yeh; Lee-Chih - Zhubei City TW
- Yeh; Lee-Chih - Hsinchu County N/A TW
- Yeh; Lee-Chih - Hsinchu TW
- Yeh; Lee-Chih - Keelung TW
- Yeh; Lee-Chih - Hsin-Chu TW
| Patent | Date |
|---|---|
| Wet Suit and Composite Cloth Thereof App 20210030089 - Yeh; Lee-Chih | 2021-02-04 |
| Reduce mask overlay error by removing film deposited on blank of mask Grant 8,589,828 - Lee , et al. November 19, 2 | 2013-11-19 |
| Reduce Mask Overlay Error By Removing Film Deposited On Blank Of Mask App 20130219350 - Lee; Hsin-Chang ; et al. | 2013-08-22 |
| Compensation of reticle flatness on focus deviation in optical lithography Grant 7,924,405 - Yeh , et al. April 12, 2 | 2011-04-12 |
| Multiple resist layer phase shift mask (PSM) blank and PSM formation method Grant 7,906,252 - Lee , et al. March 15, 2 | 2011-03-15 |
| Compensation Of Reticle Flatness On Focus Deviation In Optical Lithography App 20090027643 - Yeh; Lee-Chih ; et al. | 2009-01-29 |
| Multiple resist layer phase shift mask (PSM) blank and PSM formation method App 20070207391 - Lee; Hsin-Chang ; et al. | 2007-09-06 |
| System and method for the online design of a reticle field layout App 20050125763 - Lin, Ko-Feng ; et al. | 2005-06-09 |
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