loadpatents
name:-0.0086669921875
name:-0.0098679065704346
name:-0.00048708915710449
Yedur; Sanjay Patent Filings

Yedur; Sanjay

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yedur; Sanjay.The latest application filed is for "determining one or more profile parameters of a photomask covered by a pellicle".

Company Profile
0.8.7
  • Yedur; Sanjay - Fremont CA
  • Yedur; Sanjay - San Jose CA
  • Yedur; Sanjay - San Ramon CA
  • Yedur; Sanjay - Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Determining one or more profile parameters of a photomask covered by a pellicle
Grant 7,702,471 - Li , et al. April 20, 2
2010-04-20
Determining transmittance of a photomask using optical metrology
Grant 7,639,375 - Yedur , et al. December 29, 2
2009-12-29
Evaluating a profile model to characterize a structure to be examined using optical metrology
Grant 7,518,740 - Chard , et al. April 14, 2
2009-04-14
Automated process control using parameters determined from a photomask covered by a pellicle
Grant 7,480,062 - Li , et al. January 20, 2
2009-01-20
Determining One Or More Profile Parameters Of A Photomask Covered By A Pellicle
App 20080291467 - LI; SHIFANG ;   et al.
2008-11-27
Automated Process Control Using Parameters Determined From A Photomask Covered By A Pellicle
App 20080291429 - LI; SHIFANG ;   et al.
2008-11-27
Selecting a hypothetical profile to use in optical metrology
Grant 7,394,554 - Vuong , et al. July 1, 2
2008-07-01
Determining transmittance of a photomask using optical metrology
App 20080144919 - Yedur; Sanjay ;   et al.
2008-06-19
Evaluating a profile model to characterize a structure to be examined using optical metrology
App 20080007738 - Chard; Jeffrey A. ;   et al.
2008-01-10
Optimized model and parameter selection for optical metrology
Grant 7,092,110 - Balasubramanian , et al. August 15, 2
2006-08-15
Edge roughness measurement in optical metrology
Grant 7,046,375 - Bischoff , et al. May 16, 2
2006-05-16
Selecting a hypothetical profile to use in optical metrology
App 20050057748 - Vuong, Vi ;   et al.
2005-03-17
Edge roughness measurement in optical metrology
App 20040218192 - Bischoff, Joerg ;   et al.
2004-11-04
Optimized model and parameter selection for optical metrology
App 20040017575 - Balasubramanian, Raghu ;   et al.
2004-01-29
Carbonized antireflective coating produced by spin-on polymer material
Grant 6,117,618 - Yedur , et al. September 12, 2
2000-09-12

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed