Yatsuo; Tadateru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yatsuo; Tadateru.The latest application filed is for "negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film".

Company Profile

0.11.11

Yatsuo; Tadateru - Shizuoka JP
YATSUO; Tadateru - Haibara-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film Grant 10,007,180 - Tsuchimura , et al. June 26, 2	2018-06-26
Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound Grant 9,625,813 - Tsuchimura , et al. April 18, 2	2017-04-18
Negative Resist Composition, Resist Film Using Same, Pattern Forming Method, And Mask Blank Provided With Resist Film App 20150309408 - TSUCHIMURA; Tomotaka ; et al.	2015-10-29
Negative resist composition and pattern forming method using the same Grant 9,034,560 - Shirakawa , et al. May 19, 2	2015-05-19
Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks Grant 8,889,339 - Tsuchihashi , et al. November 18, 2	2014-11-18
Negative Resist Composition And Pattern Forming Method Using The Same App 20140227642 - SHIRAKAWA; Koji ; et al.	2014-08-14
Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition Grant 8,778,593 - Tsuchimura , et al. July 15, 2	2014-07-15
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method Grant 8,735,048 - Inasaki , et al. May 27, 2	2014-05-27
Resist Pattern Forming Method, Resist Pattern, Crosslinkable Negative Chemical Amplification Resist Composition For Organic Solvent Development, Resist Film And Resist-coated Mask Blanks App 20140030640 - TSUCHIHASHI; Toru ; et al.	2014-01-30
Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Grant 8,637,222 - Tsuchihashi , et al. January 28, 2	2014-01-28
Chemical Amplification Resist Composition, Resist Film Using The Composition, Resist-coated Mask Blanks, Resist Pattern Forming Method, Photomask And Polymer Compound App 20130302726 - TSUCHIMURA; Tomotaka ; et al.	2013-11-14
Chemical Amplification Resist Composition, And Resist Film, Resist-coated Mask Blank, Resist Pattern Forming Method And Photomask Each Using The Composition App 20130029254 - TSUCHIMURA; Tomotaka ; et al.	2013-01-31
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Composition And Pattern Forming Method App 20120301817 - Inasaki; Takeshi ; et al.	2012-11-29
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition App 20120003585 - Tsubaki; Hideaki ; et al.	2012-01-05
Negative Resist Pattern Forming Method, Developer And Negative Chemical-amplification Resist Composition Used Therefor, And Resist Pattern App 20110287234 - Tsuchihashi; Toru ; et al.	2011-11-24
Negative Resist Composition And Pattern Forming Method Using The Same App 20080241745 - Shirakawa; Koji ; et al.	2008-10-02

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