Patent | Date |
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Semiconductor device having plural patterns extending in the same direction Grant 9,209,245 - Yasuzato December 8, 2 | 2015-12-08 |
Semiconductor Device Having Plural Patterns Extending In The Same Direction App 20150162402 - YASUZATO; Tadao | 2015-06-11 |
Semiconductor device having plural patterns extending in the same direction Grant 8,994,151 - Yasuzato March 31, 2 | 2015-03-31 |
Semiconductor Device Having Plural Patterns Extending In The Same Direction App 20130320507 - YASUZATO; Tadao | 2013-12-05 |
Exposure mask, pattern formation method, and exposure mask fabrication method Grant 7,955,761 - Yasuzato June 7, 2 | 2011-06-07 |
Exposure mask and pattern forming method therefor Grant 7,923,179 - Yasuzato April 12, 2 | 2011-04-12 |
Pattern forming method and mask Grant 7,910,266 - Yasuzato March 22, 2 | 2011-03-22 |
Irradiation pattern data generation method, mask fabrication method, and plotting system Grant 7,810,066 - Yasuzato October 5, 2 | 2010-10-05 |
Mask data creation method Grant 7,691,543 - Yasuzato April 6, 2 | 2010-04-06 |
Mask data generation method and mask Grant 7,681,173 - Kosa , et al. March 16, 2 | 2010-03-16 |
Circuit pattern exposure method and mask Grant 7,632,614 - Kosa , et al. December 15, 2 | 2009-12-15 |
Exposure Mask And Pattern Forming Method Therefor App 20090202926 - YASUZATO; Tadao | 2009-08-13 |
Method For Correcting Mask Pattern, And Exposure Mask App 20090148780 - YASUZATO; TADAO | 2009-06-11 |
Exposure Mask, Pattern Formation Method, And Exposure Mask Fabrication Method App 20090081564 - YASUZATO; Tadao | 2009-03-26 |
Pattern Forming Method And Mask App 20090042108 - Yasuzato; Tadao | 2009-02-12 |
Irradiation Pattern Data Generation Method, Mask Fabrication Method, and Plotting System App 20080149859 - Yasuzato; Tadao | 2008-06-26 |
Mask data generation method and mask App 20070212620 - Kosa; Nobue ;   et al. | 2007-09-13 |
Circuit pattern exposure method and mask App 20070160918 - Kosa; Nobue ;   et al. | 2007-07-12 |
Mask data creation method App 20060246362 - Yasuzato; Tadao | 2006-11-02 |
Photomask and method of exposure using same Grant 6,150,059 - Tanabe , et al. November 21, 2 | 2000-11-21 |
Optical proximity correction halftone type phase shift photomask Grant 5,827,623 - Ishida , et al. October 27, 1 | 1998-10-27 |
Photo mask and fabrication process therefor Grant 5,750,290 - Yasuzato , et al. May 12, 1 | 1998-05-12 |
Intensity distribution simulating method Grant 5,644,390 - Yasuzato July 1, 1 | 1997-07-01 |
Optical projection aligner equipped with rotatable fly-eye lens unit Grant 5,636,005 - Yasuzato June 3, 1 | 1997-06-03 |
Process of forming bump on electrode of semiconductor chip and apparatus used therefor Grant 5,060,843 - Yasuzato , et al. October 29, 1 | 1991-10-29 |