Yao; Teruyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yao; Teruyoshi.The latest application filed is for "mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure".

Company Profile

0.12.10

Yao; Teruyoshi - Kawasaki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 8,553,198 - Yao , et al. October 8, 2	2013-10-08
Mask Pattern Correction Device, Method of Correcting Mask Pattern, Light Exposure Correction Device, and Method of Correcting Light Exposure App 20120236279 - YAO; Teruyoshi ; et al.	2012-09-20
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 8,227,153 - Yao , et al. July 24, 2	2012-07-24
Mask Pattern Correction Device, Method Of Correcting Mask Pattern, Light Exposure Correction Device, And Method Of Correcting Light Exposure App 20100209834 - YAO; Teruyoshi ; et al.	2010-08-19
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure Grant 7,732,107 - Yao , et al. June 8, 2	2010-06-08
Photomask, focus measurement apparatus and focus measurement method Grant 7,732,103 - Yao June 8, 2	2010-06-08
Local flare correction Grant 7,604,912 - Yao , et al. October 20, 2	2009-10-20
Apparatus and method for correcting pattern dimension and photo mask and test photo mask Grant 7,601,471 - Osawa , et al. October 13, 2	2009-10-13
Aligning method Grant 7,479,356 - Yao January 20, 2	2009-01-20
Aligning Method App 20080118851 - YAO; Teruyoshi	2008-05-22
Photomask, focus measurement apparatus and focus measurement method App 20080020294 - Yao; Teruyoshi	2008-01-24
Pattern size correcting device and pattern size correcting method Grant 7,240,307 - Aoyama , et al. July 3, 2	2007-07-03
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure App 20060018529 - Yao; Teruyoshi ; et al.	2006-01-26
Test photomask, flare evaluation method, and flare compensation method Grant 6,986,973 - Yao , et al. January 17, 2	2006-01-17
Apparatus and method for correcting pattern dimension and photo mask and test photo mask App 20050233226 - Osawa, Morimi ; et al.	2005-10-20
Local flare correction App 20050225736 - Yao, Teruyoshi ; et al.	2005-10-13
Pattern size correcting device and pattern size correcting method App 20050121628 - Aoyama, Hajime ; et al.	2005-06-09
Photomask App 20050095513 - Yao, Teruyoshi ; et al.	2005-05-05
Test photomask, flare evaluation method, and flare compensation method App 20040023130 - Yao, Teruyoshi ; et al.	2004-02-05
Manufacture of semiconductor device using A-C anti-reflection coating Grant 6,420,095 - Kawamura , et al. July 16, 2	2002-07-16
Manufacture of semiconductor device using a-c anti-reflection coating Grant 5,750,316 - Kawamura , et al. May 12, 1	1998-05-12

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