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name:-0.036882877349854
name:-0.022250175476074
name:-0.0026381015777588
Yano; Toshiharu Patent Filings

Yano; Toshiharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yano; Toshiharu.The latest application filed is for "composition for forming organic film, patterning process, and polymer".

Company Profile
2.27.22
  • Yano; Toshiharu - Joetsu-shi JP
  • Yano; Toshiharu - Jyoetsu JP
  • Yano; Toshiharu - Joetsu N/A JP
  • Yano; Toshiharu - Joestsu JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Composition For Forming Organic Film, Patterning Process, And Polymer
App 20210011384 - Kori; Daisuke ;   et al.
2021-01-14
Thermosetting Silicon-containing Compound, Composition For Forming A Silicon-containing Film, And Patterning Process
App 20200216670 - YANO; Toshiharu ;   et al.
2020-07-09
Patterning Process
App 20200090935 - OGIHARA; Tsutomu ;   et al.
2020-03-19
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 10,007,183 - Tachibana , et al. June 26, 2
2018-06-26
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,977,330 - Tachibana , et al. May 22, 2
2018-05-22
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
Grant 9,372,404 - Watanabe , et al. June 21, 2
2016-06-21
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,261,788 - Tachibana , et al. February 16, 2
2016-02-16
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160027653 - TACHIBANA; Seiichiro ;   et al.
2016-01-28
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160018735 - TACHIBANA; Seiichiro ;   et al.
2016-01-21
Composition for forming resist underlayer film and patterning process using the same
Grant 8,951,917 - Ogihara , et al. February 10, 2
2015-02-10
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,951,711 - Ogihara , et al. February 10, 2
2015-02-10
Composition for forming a silicon-containing resist underlayer film and patterning process using the same
Grant 8,932,953 - Ogihara , et al. January 13, 2
2015-01-13
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20140342289 - OGIHARA; Tsutomu ;   et al.
2014-11-20
Patterning process
Grant 8,859,189 - Ogihara , et al. October 14, 2
2014-10-14
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
Grant 8,852,844 - Ogihara , et al. October 7, 2
2014-10-07
Patterning process and composition for forming silicon-containing film usable therefor
Grant 8,835,102 - Ogihara , et al. September 16, 2
2014-09-16
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
Grant 8,697,330 - Ogihara , et al. April 15, 2
2014-04-15
Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 8,652,750 - Ogihara , et al. February 18, 2
2014-02-18
Coated-type silicon-containing film stripping process
Grant 8,652,267 - Ogihara , et al. February 18, 2
2014-02-18
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20130337649 - TACHIBANA; Seiichiro ;   et al.
2013-12-19
Organic Film Composition, Method For Forming Organic Film And Patterning Process Using This, And Heat-decomposable Polymer
App 20130302990 - WATANABE; Takeru ;   et al.
2013-11-14
Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
Grant 8,501,386 - Ogihara , et al. August 6, 2
2013-08-06
Composition For Forming A Silicon-containing Resist Underlayer Film And Patterning Process Using The Same
App 20130045601 - OGIHARA; Tsutomu ;   et al.
2013-02-21
Composition For Forming Resist Underlayer Film And Patterning Process Using The Same
App 20130005150 - OGIHARA; Tsutomu ;   et al.
2013-01-03
Patterning process
Grant 8,343,711 - Ogihara , et al. January 1, 2
2013-01-01
Patterning Process
App 20120276483 - OGIHARA; Tsutomu ;   et al.
2012-11-01
Patterning Process And Composition For Forming Silicon-containing Film Usable Therefor
App 20120238095 - OGIHARA; Tsutomu ;   et al.
2012-09-20
Silicon-containing Film-forming Composition, Silicon-containing Film-formed Substrate, And Patterning Process
App 20120052685 - OGIHARA; Tsutomu ;   et al.
2012-03-01
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
Grant 8,029,974 - Ogihara , et al. October 4, 2
2011-10-04
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
Grant 8,026,038 - Ogihara , et al. September 27, 2
2011-09-27
Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Grant 7,875,417 - Ogihara , et al. January 25, 2
2011-01-25
Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
App 20100285407 - Ogihara; Tsutomu ;   et al.
2010-11-11
Patterning process
App 20100273110 - Ogihara; Tsutomu ;   et al.
2010-10-28
Coated-type silicon-containing film stripping process
App 20100147334 - Ogihara; Tsutomu ;   et al.
2010-06-17
Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
App 20100086870 - Ogihara; Tsutomu ;   et al.
2010-04-08
Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
App 20100086872 - Ogihara; Tsutomu ;   et al.
2010-04-08
Metal Oxide-containing Film-forming Composition, Metal Oxide-containing Film, Metal Oxide-containing Film-bearing Substrate, And Patterning Method
App 20090136869 - OGIHARA; Tsutomu ;   et al.
2009-05-28
Silicon-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20090011372 - Ogihara; Tsutomu ;   et al.
2009-01-08
Silicone-containing Film-forming Composition, Silicon-containing Film, Silicon-containing Film-bearing Substrate, And Patterning Method
App 20080274432 - Ogihara; Tsutomu ;   et al.
2008-11-06

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