loadpatents
name:-0.016261100769043
name:-0.015035152435303
name:-0.00039315223693848
Yang; Yun-sik Patent Filings

Yang; Yun-sik

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Yun-sik.The latest application filed is for "remote plasma generator using ceramic".

Company Profile
0.12.14
  • Yang; Yun-sik - Suwon-si KR
  • Yang; Yun-Sik - Gyeonggi-do KR
  • Yang; Yun-sik - Suwon KR
  • Yang; Yun-Sik - Kyunggi-do KR
  • Yang, Yun-Sik - Suwon-city KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Remote plasma generator using ceramic
Grant 9,773,645 - Lee , et al. September 26, 2
2017-09-26
Remote Plasma Generator Using Ceramic
App 20160307739 - LEE; Ja-woo ;   et al.
2016-10-20
Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
Grant 8,083,892 - Min , et al. December 27, 2
2011-12-27
Semiconductor etching apparatus
Grant 7,764,483 - Kim , et al. July 27, 2
2010-07-27
Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
App 20090229758 - Min; Young-Min ;   et al.
2009-09-17
Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
Grant 7,578,944 - Min , et al. August 25, 2
2009-08-25
Methods And Apparatus For Semiconductor Etching Including An Electro Static Chuck
App 20080194113 - Kim; Jin-Man ;   et al.
2008-08-14
Apparatus For Depositing Thin Film And Method Of Depositing The Same
App 20080095953 - LEE; Heok-Jae ;   et al.
2008-04-24
Semiconductor etching apparatus
App 20080066867 - Kim; Jin-Man ;   et al.
2008-03-20
Photolithography System And Method
App 20070297794 - PARK; Byong-Cheol ;   et al.
2007-12-27
Method for generating gas plasma
Grant 7,193,369 - Min , et al. March 20, 2
2007-03-20
Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
App 20060084269 - Min; Young-Min ;   et al.
2006-04-20
Substrate manufacturing apparatus and substrate transfer module used therein
App 20050220576 - Kim, Ki-Sang ;   et al.
2005-10-06
Plasma chemical vapor deposition apparatus having an improved nozzle configuration
App 20050092245 - Moon, Ahn-Sik ;   et al.
2005-05-05
Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus
Grant 6,860,801 - Yang , et al. March 1, 2
2005-03-01
Input/output valve switching apparatus of semiconductor manufacturing system
Grant 6,824,617 - Yang , et al. November 30, 2
2004-11-30
RF matching unit
Grant 6,816,029 - Choi , et al. November 9, 2
2004-11-09
Method and apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
App 20040092119 - Min, Young-Min ;   et al.
2004-05-13
Method of and apparatus for use in orienting an object at a reference angle
Grant 6,705,020 - Keum , et al. March 16, 2
2004-03-16
Method of and an apparatus for regulating the temperature of an electrostatic chuck
Grant 6,684,652 - Kim , et al. February 3, 2
2004-02-03
Focus ring and apparatus for processing a semiconductor wafer comprising the same
Grant 6,623,597 - Han , et al. September 23, 2
2003-09-23
Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus
App 20030045219 - Yang, Yun-Sik ;   et al.
2003-03-06
Input/output valve switching apparatus of semiconductor manufacturing system
App 20030010450 - Yang, Yun-Sik ;   et al.
2003-01-16
Method of and an apparatus for regulating the temperature of an electrostatic chuck
App 20020174667 - Kim, Jin-Man ;   et al.
2002-11-28
RF matching unit
App 20020023718 - Choi, Dae-Kyu ;   et al.
2002-02-28
Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers
Grant 6,039,770 - Yang , et al. March 21, 2
2000-03-21

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