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Patent applications and USPTO patent grants for Yang; Siwon.The latest application filed is for "method of forming multiple patterned layers on wafer and exposure apparatus thereof".
Patent | Date |
---|---|
Correction method of photomask pattern Grant 11,340,523 - Yang , et al. May 24, 2 | 2022-05-24 |
Method of forming multiple patterned layers on wafer and exposure apparatus thereof Grant 11,342,184 - Jeon , et al. May 24, 2 | 2022-05-24 |
Method Of Forming Multiple Patterned Layers On Wafer And Exposure Apparatus Thereof App 20210159071 - JEON; BUM-HWAN ;   et al. | 2021-05-27 |
Correction Method Of Photomask Pattern App 20200218144 - YANG; SIWON ;   et al. | 2020-07-09 |
Alignment System App 20200219746 - YANG; SIWON ;   et al. | 2020-07-09 |
Combustor Grant 9,464,807 - Kim , et al. October 11, 2 | 2016-10-11 |
Combustor App 20150211740 - KIM; Sinhyun ;   et al. | 2015-07-30 |
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