YANG; Seung Hune

Patent Applications and Registrations

Patent applications and USPTO patent grants for YANG; Seung Hune.The latest application filed is for "process proximity correction method and the computing device for the same".

Company Profile

0.13.15

YANG; Seung Hune - Seoul KR
Yang; Seung-hune - Kyungki-do KR
Yang; Seung Hune - Sungnam KR
Yang; Seung-hune - Youngin KR
Yang, Seung Hune - Sungnam-City KR
Yang; Seung-hune - Yongin KR
Yang, Seung-Hune - Yongin-city KR
Yang, Seung-hune - Youngin-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process Proximity Correction Method And The Computing Device For The Same App 20220035237 - LEE; Soo Yong ; et al.	2022-02-03
Method of calculating a shift value of a cell contact Grant 10,126,646 - Yang , et al. November 13, 2	2018-11-13
Method Of Calculating A Shift Value Of A Cell Contact App 20170269472 - YANG; KI-HO ; et al.	2017-09-21
Method of calculating a shift vale of a cell contact Grant 9,703,189 - Yang , et al. July 11, 2	2017-07-11
Method for detecting defect in pattern Grant 9,542,740 - Kim , et al. January 10, 2	2017-01-10
Method Of Calculating A Shift Vale Of A Cell Contact App 20160070163 - YANG; KI-HO ; et al.	2016-03-10
Method For Detecting Defect In Pattern App 20150131891 - KIM; Ki-Hyun ; et al.	2015-05-14
Test pattern selection method for OPC model calibration Grant 8,677,288 - Vengertsev , et al. March 18, 2	2014-03-18
Method of manufacturing photo-mask Grant 8,614,034 - Moon , et al. December 24, 2	2013-12-24
Test Pattern Selection Method For Opc Model Calibration App 20130175240 - VENGERTSEV; Dmitry ; et al.	2013-07-11
Method Of Approximating Value Of Critical Dimension Of Pattern Formed By Photolithography And Method Of Fabricating Photomask Including Opc Based On Approximated Value Of A Cd Of A Pattern App 20120237859 - Yang; Seung-hune ; et al.	2012-09-20
Method Of Manufacturing Photo-mask App 20120208111 - MOON; Seong-ho ; et al.	2012-08-16
Exposure method for correcting line width variation in a photomask Grant 7,185,312 - Ki , et al. February 27, 2	2007-02-27
Exposure apparatus including micro mirror array and exposure method using the same Grant 7,061,582 - Zinn , et al. June 13, 2	2006-06-13
Exposure method for correcting line width variation in a photomask App 20040229138 - Ki, Won-tai ; et al.	2004-11-18
Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof Grant 6,783,905 - Yang August 31, 2	2004-08-31
Exposure method for correcting line width variation in a photomask Grant 6,775,815 - Ki , et al. August 10, 2	2004-08-10
Exposure apparatus including micro mirror array and exposure method using the same App 20040057034 - Zinn, Shun Yong ; et al.	2004-03-25
Technique of exposing a resist using electron beams having different accelerating voltages Grant 6,641,979 - Yang November 4, 2	2003-11-04
Electron beam exposure method having good linearity with respect to producing fine patterns Grant 6,627,366 - Yang September 30, 2	2003-09-30
Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique App 20030148220 - Yang, Seung-Hune	2003-08-07
Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof App 20030124442 - Yang, Seung-hune	2003-07-03
Exposure method for correcting line width variation in a photomask App 20030061595 - Ki, Won-tai ; et al.	2003-03-27
Electron beam exposure method having good linearity with respect to producing fine patterns App 20020115020 - Yang, Seung-Hune	2002-08-22
Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique App 20020042005 - Yang, Seung-Hune	2002-04-11

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