| Patent | Date |
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Methods For Etching Metal Films Using Plasma Processing
App 20210118693 - Joy; Nicholas ; et al. | 2021-04-22 |
Oxygen-Free Plasma Etching For Contact Etching of Resistive Random Access Memory
App 20200203607 - Koty; Devi ; et al. | 2020-06-25 |
Process for patterning a magnetic tunnel junction
Grant 10,651,372 - Yang | 2020-05-12 |
Process For Patterning A Magnetic Tunnel Junction
App 20180358548 - Yang; Qingyun | 2018-12-13 |
Inclusion complexes of pinocembrin with cyclodextrin or its derivatives
Grant 9,949,946 - Wu , et al. April 24, 2 | 2018-04-24 |
Method of replacement source/drain for 3D CMOS transistors
Grant 9,105,741 - Chan , et al. August 11, 2 | 2015-08-11 |
Replacement Source/drain For 3d Cmos Transistors
App 20140070316 - Chan; Kevin K. ; et al. | 2014-03-13 |
Method of removing high-K dielectric layer on sidewalls of gate structure
Grant 8,481,389 - Zhang , et al. July 9, 2 | 2013-07-09 |
Gate patterning of nano-channel devices
Grant 8,445,948 - Fuller , et al. May 21, 2 | 2013-05-21 |
Method for resolution of a mixture of pinocembrin optical isomers, especially a pinocembrin racemate
Grant 8,399,691 - Wu , et al. March 19, 2 | 2013-03-19 |
Method of Removing High-K Dielectric Layer on Sidewalls of Gate Structure
App 20120256278 - Zhang; Ying ; et al. | 2012-10-11 |
Inclusion Complexes Of Pinocembrin With Cyclodextrin Or Its Derivatives
App 20110218173 - Wu; Song ; et al. | 2011-09-08 |
Gate Patterning Of Nano-channel Devices
App 20110006367 - Fuller; Nicholas C.M. ; et al. | 2011-01-13 |
Gate patterning of nano-channel devices
Grant 7,816,275 - Fuller , et al. October 19, 2 | 2010-10-19 |
Method For Resolution Of A Mixture Of Pinocembrin Optical Isomers, Especially A Pinocembrin Racemate
App 20100261916 - Wu; Song ; et al. | 2010-10-14 |
Gate Patterning Of Nano-channel Devices
App 20100252810 - Fuller; Nicholas C. M. ; et al. | 2010-10-07 |
Integration schemes for fabricating polysilicon gate MOSFET and high-K dielectric metal gate MOSFET
Grant 7,435,652 - Chen , et al. October 14, 2 | 2008-10-14 |
Integration Schemes For Fabricating Polysilicon Gate Mosfet And High-k Dielectric Metal Gate Mosfet
App 20080242070 - Chen; Tze-chiang ; et al. | 2008-10-02 |
Method And System For Plasma Etching Having Improved Across-wafer Etch Uniformity
App 20080194112 - Yang; Qingyun ; et al. | 2008-08-14 |
Method Of Forming Disposable Spacers For Improved Stressed Nitride Film Effectiveness
App 20080182372 - Liu; Joyce C. ; et al. | 2008-07-31 |
Method of making sub-lithographic features
Grant 6,960,510 - Deshpande , et al. November 1, 2 | 2005-11-01 |
Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching
Grant 6,864,041 - Brown , et al. March 8, 2 | 2005-03-08 |
Method for uniform reactive ion etching of dual pre-doped polysilicon regions
Grant 6,828,187 - Liu , et al. December 7, 2 | 2004-12-07 |
Method to form gate conductor structures of dual doped polysilicon
Grant 6,703,269 - Brown , et al. March 9, 2 | 2004-03-09 |
Method of making sub-lithographic features
App 20040002203 - Deshpande, Sadanand V. ; et al. | 2004-01-01 |
Method to form gate conductor structures of dual doped polysilicon
App 20030186492 - Brown, Jeffrey J. ; et al. | 2003-10-02 |
Method to controllably form notched polysilicon gate structures
Grant 6,541,320 - Brown , et al. April 1, 2 | 2003-04-01 |
Method To Controllably Form Notched Polysilicon Gate Structures
App 20030032225 - Brown, Jeffery ; et al. | 2003-02-13 |
Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching
App 20020164546 - Brown, Jeffrey J. ; et al. | 2002-11-07 |
Fabrication of notched gates by passivating partially etched gate sidewalls and then using an isotropic etch
App 20020132437 - Tsou, Len Y. ; et al. | 2002-09-19 |
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