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Patent applications and USPTO patent grants for Yang; Min-An.The latest application filed is for "method for forming photomask and photolithography method".
Patent | Date |
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Method for forming photomask and photolithography method Grant 11,307,492 - Chang , et al. April 19, 2 | 2022-04-19 |
Method For Forming Photomask And Photolithography Method App 20210080822 - CHANG; Shih-Ming ;   et al. | 2021-03-18 |
Method for forming photomask and photolithography method Grant 10,845,699 - Chang , et al. November 24, 2 | 2020-11-24 |
Photomask and fabrication method therefor Grant 10,816,891 - Chang , et al. October 27, 2 | 2020-10-27 |
Method and system for processing substrate by chemical solution in semiconductor manufacturing fabrication Grant 10,508,953 - Yang , et al. Dec | 2019-12-17 |
Method For Forming Photomask And Photolithography Method App 20190163051 - CHANG; Shih-Ming ;   et al. | 2019-05-30 |
Method And System For Processing Substrate By Chemical Solution In Semiconductor Manufacturing Fabrication App 20180161828 - YANG; Min-An ;   et al. | 2018-06-14 |
Photomask And Fabrication Method Therefor App 20180164675 - CHANG; Hao-Ming ;   et al. | 2018-06-14 |
Method for repairing photomask Grant 8,703,364 - Hsieh , et al. April 22, 2 | 2014-04-22 |
Method For Repairing Photomask App 20130295494 - Hsieh; Kun-Lung ;   et al. | 2013-11-07 |
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